【作者】 胡滢； 曹为民； 印仁和； 曾绍海； 王慧娟；

【Author】 HU Ying,CAO Wei-min, YIN Ren-he,ZENG Shao-hai,YU Wen-qing,WANG Hui-juan (School of Science,Shanghai University,Shanghai 200436,China)

【机构】 上海大学理学院化学系；

【摘要】 采用恒电位双电解槽法在硼酸镀液体系中,以单晶Si(111)为基底电沉积制备Co/Cu多层膜,确定了双槽法制备多层膜的工艺条件,为得到优良的多层膜巨磁阻材料,镀液体系中加入了自制的添加剂.并用扫描电镜(SEM)表征了多层膜的断面形貌,小角度X射线衍射(LXRD)谱图中出现了二个衍射峰,大角度X射线衍射(MXRD)谱图中强衍射峰的两侧出现了卫星峰,表明多层膜具有超晶格结构.用物性测量系统(PPMS)测试了Co/Cu多层膜的巨磁阻(GMR)性能,GMR值达到52%.更多还原

【Abstract】 Co/Cu multilayers were prepared by using double-bath method containing boric acid solution.The technological conditions were studied,in order to get good multilayer,additives have been studied,the cross-section profile of multiplayer was examined by SEM,respectively,two diffraction peaks in the LXRD indicated that the multi-player has periodic structure,satellite peaks in the MXRD patterns indicate that the multilayer has formed a superlattice structure,in addition,GMR that was measured by PPMS has arrived 52%.更多还原