【作者】 张晓东；

【导师】 黄其煜； 吕煜坤；

【作者基本信息】 上海交通大学 ， 集成电路工程（专业学位）， 2019， 硕士

【摘要】 本文介绍了国内对集成电路芯片的巨大需求,分析了12英寸集成电路生产线管控洁净厂房空气质量的必要性和重要性。介绍了一般净化厂房对洁净度管控的方式。介绍了集成电路生产线的几种自动物料运输系统AMHS(Automated Material Handling System),分析了全自动12英寸生产线AMHS的特点以及管控环境颗粒和分子级空气污染AMC(Airborne Molecular Contamination)的不利因素和难点。本文研究了上海市近年大气环境颗粒浓度和AMC浓度的变化,得出了若干典型规律,并找到了外部大气和洁净室内部洁净室空气质量的相关性规律。在颗粒研究方面,说明了掩模版颗粒对工艺质量和生产效率的严重影响。使用鱼骨图分析法对掩模版颗粒的发生机理进行了研究,开展了一系列实验,找到了洁净室环境颗粒浓度和掩模版颗粒发生率正相关的规律,确定了关键点是掩模版载台上方的空间的颗粒浓度和相应的发生途径主要是颗粒沉降,得出了有效结论并建立了相应的处置措施系统,有效降低了掩模版颗粒的发生,使其发生率降低了30%以上,解决了该实际工程问题。在AMC方面,基于对大气环境AMC浓度变化规律的研究结论,对洁净室AMC浓度管控的方法进行了研究,提出了具有成本优势的AMC管控模型并应用于生产线,提高了生产线对AMC的管控能力。介绍了12英寸集成电路生产线的掩模版的雾状缺陷,说明了AMC和掩模版雾状缺陷的关系。介绍了总挥发性有机物TVOC(Total Volatile Organic Compound)对关键工艺的影响,通过研究和总结,我们得出了能够有效反应和解决TVOC浓度突跳问题的途径和结论。建立了TVOC浓度突发跳高的调查和处置模型,建立了针对工厂外部和工厂生产线的排查清单,并有效应用于生产线实际工作,分析研究了一次成功的异常处置案例。更多还原

【Abstract】 This thesis introduces the huge demand for integrated circuit chips in China,and analyzes the necessity and importance of air quality control in a 12-inch integrated circuit production line.The cleanliness control method of general purification plant is introduced.Several kinds of AMHS(Automated Material Handling System)in IC production line are introduced.The characteristics of AMHS in automatic 12-inch production line and the difficulties in controlling environment particles and AMC(Airborne Molecular Contamination)are analyzed.In this paper,the variation of atmospheric particulate concentration and AMC concentration in Shanghai in recent years has been studied,and some typical laws have been obtained,and the correlation between the external atmosphere and the air quality of the clean room has been found.In particle research,the serious influence of mask particles on process quality and production efficiency is explained.A series of experiments were carried out to find out the positive correlation between the particle concentration in the clean room environment and the occurrence rate of the mask particles.The key points were the particle concentration in the space above the mask platform and the corresponding occurrence pathway was mainly particle deposition.The effective conclusion is drawn and the corresponding disposal system is established,which effectively reduces the occurrence of mask particles and reduces the occurrence rate by more than 30%.The practical engineering problem is solved.In the aspect of AMC,based on the research conclusion of the variation law of AMC concentration in atmospheric environment,the method of AMC concentration control in clean room was studied,and the AMC control model with cost advantage was put forward and applied to the production line,and improved the control ability of AMC.The haze defects of mask in 12-inch IC production line are introduced.The relationship between AMC and haze defects of mask is explained.This paper introduces the influence of TVOC(Total Volatile Organic Compound)on the key process.Through the research and summary,we have obtained the way and conclusion which can effectively react and solve the problem of TVOC concentration jump.We establish the investigation and disposal model of TVOC concentration sudden jump,and establish the checklist aiming at the outside of the factory and the production line of the factory,and effectively apply it to the actual work of the production line,analyze and study a successful case of abnormal disposal.更多还原