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射频溅射法制备GBCO超导薄膜的研究
Research of GBCO Superconductor Film Deposited by RF Sputtering
【作者】 朱鹏；
【导师】 李贻杰；
【作者基本信息】 上海交通大学 ， 物理学， 2013， 硕士
【摘要】 高温超导材料因其得天独厚的材料性能而使得它具有广泛应用的潜力，而第二代高温超导带材是这一应用的最主要体现形式。本文主要研究了各个工艺参数对GdBaCu2O7超导薄膜在具备优异织构的CeO2隔离层基底上生长的影响，包括温度、压强和气体成分（氧气氩气含量之比）等对薄膜生长过程的影响，例如对薄膜生长过程中的生长取向、薄膜表面形貌、粗糙度等的影响，并对这一过程进行分析，试图阐明了其原因。本论文主要取得了以下结果：1.为保持GdBaCu2O7薄膜的定向生长，生长取向沿c轴，故在一系列准连续温度条件下进行沉积对比实验，实验结果表明沉积基底温度在880℃附近时，能够沉积具有良好取向的GdBaCu2O7薄膜，此时薄膜具有良好的织构和较小的X射线衍射半峰宽。2.在最优化基底温度880℃下，进行气体压强对比实验，分别进行了一系列不同压强环境下的沉积实验，实验结果表明在压强为40Pa附近时能沉积出表面光滑的薄膜。3.在确定最佳生长温度和压强参数之后，研究了在相同气压环境下，不同的氧气氩气含量比例对薄膜生长的影响。实验结果表明：在氧气氩气比例较高的情况下，即氧气含量相对较高时，沉积的薄膜的晶粒粒径较大，较为致密，而随着氧氩比例的减小，即氧气含量逐渐减小的条件下，沉积所得薄膜的表面粗糙度逐渐增加，晶粒变得越来越小，综合各方面因素考虑，我们认为当氧气氩气的比例为1：1的情况下，可以沉积出具有较好表面形貌和良好织构的GdBaCu2O7薄膜。
【Abstract】 High temperature Superconductor, due to its outstanding performancein electricity transporting and magnetic properties, has a promising wideapplication. The strip superconductor is the main function representation.We investigated several elements which can affect the performance ofGdBaCu2O7films deposited on CeO2substrate by RF sputteringinclude temperature, gas pressure and gas component, find out how theyaffect the films’ grow orientation, surface morphology and roughness. Atlast we analyzed the process and reasons.After these experiments, we got following conclusion:1. For the sake of finding the optical grow temperature which can letthe film grow along the right orientation; we configured several comparingexperiments and found that when the substrate temperature is nearby at880degree, we can get GdBaCu2O7films with high quality.2. We configure several experiments with different gas pressure tofind the optimal pressure condition while the substrate temperature is fixedat880degree, and the results demonstrated that40Pa is a good condition.3. After study the influence of temperature and gas pressure, we have researched how the oxygen argon ratio affects the films’ performance. Wefound that when the O2/Ar ratio at a high level (means that the oxygencomponent at a high level), the grain sizes would be large and the films aredense, with decreasing oxygen argon ratio, the roughness of the film wouldenhance, and the grain size reduced as well. Take all the effects intoaccount, we recommend that the optimum oxygen argon ratio is1:1.