【作者】 王强；

【导师】 张流强；

【作者基本信息】 重庆大学 ， 光学工程， 2007， 硕士

【摘要】 光学光刻技术一直是微加工技术的主流技术之一,是近来世界各国研究的重点。本论文在纵观了光学光刻技术的国内外发展现状的基础上,针对高校、普通研究所等科研单位的需求,进行了一种价格低、结构简单、操作方便的不同于以往光刻系统的新型光刻技术——紫外扫描光刻技术的研究,具有十分重要的理论意义和迫切的需求背景。论文在全面分析了现有几种光刻方式各自特点的基础上,对球面波的传输、整形特性,以及聚焦时光强极大值点的焦移等问题作了详细的研究,提出了一种集合了电子束光刻和光学光刻各自优点的扫描式光刻的新思想和新方法。进行了紫外扫描光刻系统光学部分的结构设计、分析和模拟仿真,确定了系统整体方案;进行了驱动电路、光学耦合方式、光束聚焦方式等关键技术的探索研究,并搭建实验平台,进行相关的测试和实验分析。论文的主要研究工作是:1.分析微加工技术的国内外发展现状,特别是对光学光刻的发展现状和趋势进行全面的分析;2.比较目前常用的几种紫外光源,选择合适的光源,并对其驱动电路进行仿真设计和实验分析;3.较深入地比较分析球面波与高斯光束的特点,对光学耦合系统和光束聚焦系统进行详细的分析和设计;4.进行相关的光学实验,并对实验结果进行分析和讨论。更多还原

【Abstract】 Optical photolithography is always a mainstream technology for micro-processing technology, it’s the key point of which many countries research on recently. Based on the investigation of world optical photolithography technology development and progress, and the target to satisfy the application demands of the High schools, universities and institutes and so on, this paper studies on one kind of novel photolithography technology——ultraviolet scanning photolithography which takes advantages of low price, simple structure and easy operation. This work has both theory significance and urgent demand background.Based on the understanding and analysis of typical photolithography methods, the transmission and reshaping characteristic of spherical wave, as well as the focal point shift of the optical system and so on were all described in detail in this paper, Then, this paper proposes a novel design of scanning photolithography which has gathered respective merit of the electron beam photolithography and the optical photolithography.The design, analysis and simulation of the ultraviolet scanning photolithography system are performed with a special consideration on optics; The key technologies such as drive electric circuit, optics coupling manner, light beam focusing system are systematically explored, at last the testing platform is established, and the experimental adjust, test, and analysis are carried on.This paper is focused on the following aspects:1. Based on scrutinizing and analyzing the literatures, analyzes the latest development in the area of micro-processing, especially the development and present state of the photolithography.2. Compares with several kind of ultraviolet photosources, chooses the appropriate one, and carries on the simulation design and the experiment on its drive electric circuit.3. Thoroughly compare and analyze the characteristic of the spherical wave and the Gauss light beam, carries on the detailed analysis and design on optically coupled system and the light beam focusing system4. Carries on the correlation optical experiment, analyzes and discusses on the experimental result.更多还原