【作者】 顾盼；

【导师】 刘景全；

【作者基本信息】 上海交通大学 ， 微电子学与固体电子学， 2007， 硕士

【摘要】 根据摩尔定律,芯片上的集成元件数每18个月数目增加一倍。但是随着技术的进步,光刻设备的价格也随之上升。而纳米压印技术作为很有希望的下一代光刻技术,具有成本低,重复性好,可控性强等一系列优点,逐渐被应用于微细加工的各个领域。本文在对纳米压印技术的前景以及国内外相关工作进行回顾的基础上,针对热压印技术及其应用展开了一系列研究。本文首先介绍了热压的工艺流程,随后尝试采用热压工艺完成具体器件的复制。实验中复制的器件为周期1.67u、阳型线宽830nm左右的微纳光栅。该微纳光栅准备应用于波长为1.55u的波分复用系统。实验中采用全息衍射和感应耦合等离子刻蚀的方法制备了光栅的模具,得到了一定深度的熔融石英光栅。随后采用热压工艺,采用PETG材料完成了压印过程,并优化了压印参数,分析了压印过程的缺陷。由于压印是在微结构上完成的,因此摩擦力以及随之而产生的脱模成为影响压印质量的一个关键问题。为了进一步得到更好的压印结果,采用三氯硅烷的自组装以及RIE反应两种方法在表面形成薄膜,并测试了形成薄膜表面的平均粗糙度、与水的接触角、表面能以及表面形貌,验证了这两种抗粘连薄膜在纳米压印过程中的有效性,得到了更好的微结构光栅器件。更多还原

【Abstract】 Moore’s Law tells us that the number of transistors on a microprocessor would double approximately every 18 months. But with the development of technology, the cost of lithography equipment increases. Nanoimprint is a promising Next Generation Lighography(NGL) technology. And now it is gradually applied on different areas of microfabrication for its advantages such as low cost, good reduplication, easy to control.In this thesis, we review the background and the related research of nanoimprint at home and abroad, and then we begin the research in application of nanoimprint. This thesis introduces the technology process of hot-pressed nanoimprint firstly, and then tries to reduplicate the specific device by nanoimprint technology. The device we decide to reduplicate is micro-structured grating. The period of the grating pattern is 1.67μand the line width is 830nm. The micro-structured grating would applied on the dense wavelength division multiplexing (DWDM) at the wavelength of 1550nm. The stamp of grating is fabricated by holographic diffraction and inductive coupled plasma (ICP) technology. Then we get the imprinted pattern by hot-pressed technology and use polyethylene terephthalate glycol (PETG) as the imprinted material. In this experiment, we optimize the parameters in the imprint process and analyze the disadvantages of this technology.Because the imprint process is used on micro-structure, the friction force and the removing of stamp is a key problem for the quality of imprinted pattern. For a better imprint result, we fabricate the anti-adhesive film on the surface of stamp by 1H,1H,2H, 2H-perfluorodecyltrichlorosilane and RIE reaction. We still test the average roughness, contact angle, surface energy and appearance of the surface. They all prove that these two kinds of anti-adhesive film are effective in the process of nanoimprint and can help us更多还原