【作者】 曹阳珍；

【导师】 孙方宏； 强炳琪；

【作者基本信息】 上海交通大学 ， 机械工程， 2007， 硕士

【摘要】 本文对低摩擦系数金刚石薄膜的研究现状和发展趋势进行了综合评述,从低摩擦系数金刚石薄膜的沉积原理和工艺以及金刚石薄膜效应表征等方面分析了国内外最新研究成果,比较了常规和低摩擦系数金刚石薄膜不同沉积工艺和形核生长机理,对低摩擦系数金刚石薄膜的硬度、内应力、摩擦特性等机械性能也作了概述,在此基础上,提出在常规金刚石薄膜基础上沉积低摩擦系数金刚石薄膜的组成复合涂层的新方法。CVD金刚石薄膜具有天然金刚石的高硬度、高导热系数、低摩擦系数和低热膨胀系数等优异性能。随着CVD沉积技术的不断成熟,金刚石薄膜实际应用受到越来越广泛的重视。然而,由于常规金刚石涂层表层晶粒粗大、表面粗糙、很难抛光,直接限制了CVD金刚石薄膜在摩擦磨损领域的应用。与之相比,低摩擦系数的金刚石薄膜则具有表面光滑平整,表面粗糙度远低于常规金刚石薄膜,摩擦系数小以及硬度略低于常规金刚石薄膜便于后续抛光处理等特性。低摩擦系数金刚石薄膜可大大拓展金刚石薄膜在支撑器、微机电系统(MEMS)等领域中的应用。在轴承支撑器和耐磨器件表面最容易获得实际使用效果和实现产业化。制备大面积、均匀平坦的金刚石薄膜,对CVD金刚石薄膜在支撑器和耐磨器件等方面应用具有重要意义。本文采用热丝CVD法(HFCVD),以丙酮和氢气为原料,在硬质合金YG6(WC-Co6%)衬底上沉积高质量金刚石薄膜和金刚石复合薄膜,以及在光滑硬质合金YG6衬底上直接沉积低摩擦系数金刚石薄膜,并采用扫更多还原

【Abstract】 In this paper, the lastest development of lower friction diamond films with regard to nucleation and growth mechanism, deposition technology and its research trend. the differences between conventional and lower friction diamond films in terms of nucleation and growth mechanism and deposition technology were compared and also, the mechanical performance of lower friction diamond films such as hardness, compressive stress, tribological properties and so on were analyzed. At last, a new method of forming composite diamond coating by depositing lower friction diamond films onto conventional films layer was put forward.CVD diamond thin films possess the unique characteristics of the native diamond such as high hardness, wear resistance, good thermal conductivity and low thermal expansion coefficient. Recently, with the development of the technique of chemical-vapor-deposited (CVD) diamond films, synthesis and characterization of diamond films have gained wide spread research interest. Because of their large surface crystals, coarse surface and polishing difficulty, the conventional diamond films更多还原