【作者】 李智峰；

【导师】 史峥；

【作者基本信息】 浙江大学 ， 电路与系统， 2006， 硕士

【摘要】 进入超深亚微米阶段后,集成电路制造工艺中普遍采用了亚波长光刻技术。然而随着特征尺寸逐渐接近光刻分辨率极限,制造过程中会发生光学邻近效应现象,导致硅片上的成像与原始版图有着巨大的差异,从而严重影响了集成电路的电学性能和成品率。为此,人们提出了分辨率增强技术。分辨率增强技术的广泛应用一定程度上解决了亚波长光刻中的许多可制造性问题,因此成为了人们研究的重点。 空间滤波技术主要是指离轴照明技术和光瞳滤波技术,它们都是通过改变入瞳体或出瞳体的物体的频谱的分布,达到降低低频分量,相对提高高频分量,最终提高光强对比度,从而提高光刻分辨率。 光刻模型是分辨率增强技术的基础,本文主要研究利用空间滤波技术提高光刻模型的精度,从而提高光刻分辨率。本文先介绍了集成电路的制造过程和光刻工艺的技术背景,提出了自主开发的光刻模拟工具Litholab,并以Litholab为研究平台,深入研究了光源模型的优化策略和光瞳函数的优化策略,提出了使用连续函数表征的光源模型和考虑了像差因素的光瞳模型。试验结果表明,新的光源模型和光瞳模型都能较好的提高光刻模型的精度。更多还原

【Abstract】 As the technology node of IC(integrated circuits) manufacturing came into the VDSM(Very Deep Sub-micron) era, the so-called Sub-Wavelength Lithography has been widely used. However, Optical Proximity Effect(OPE) happens when the feature and spacing dimension are shorter than half of the wavelength of lithography light source. OPE will result in the sharp difference between the wafer and the original layout, which will make the circuits invalid and effect the yield. Resolution Enhancement Technology(RET) has been developed to solve the problem. Being used widely, RETs have become the focus of the research in the global IC industry. Spatial filtering technologies including Off Axis Illumination(OAI) and Pupil filtering(PF) are new RETs. These technologies can enhance the resolution of lithography by changing the distribution of the object’s spectrum in and out of the pupil, and then decreasing the object’s lower frequency parts and increasing higher frequency parts.Modeling of the lithography is essential to the RETs. The main research of this paper focuses on the uses of spatial filtering technologies in improving the performance of the lithography models. The manufacturing processes of the IC and lithography technologies are introduced in this paper. Also, the paper presents a new lithography simulation tool called Litholab which provide a research platform of lithography modeling. Optimization strategies of illumination model and pupil function are introduced. And a new source model with continuous representation and a new pupil function with consideration of lens aberrations are presented as well. The results of experiments prove that new models provide higher precision than normal models.更多还原