【作者】 赵健；

【导师】 丁志敏；

【作者基本信息】 大连交通大学 ， 材料学， 2005， 硕士

【摘要】 本课题利用化学镀技术在塑料基体上镀铜、镀镍硼,然后将基体塑料溶解得到镍硼箔膜。在研究氯化镍,硼氢化钾、乙二胺和硝酸铅浓度以及温度、pH值对镀覆速率影响的基础上,利用X射线衍射、透射电镜等分析手段,测试了镍硼箔膜镀态以及晶化后的组织和有关性能。试验结果表明: 利用化学镀结合非晶晶化法可以得到晶粒近似为39～47nm的Ni-B晶体箔; 镍硼沉积速率随着氯化镍,硼氢化钾、乙二胺、硝酸铅、氢氧化钠浓度的增大,出现先增后降的变化趋势;镀覆速率随温度升高增大; 含硼量2.002wt%的镍硼合金在301℃和432℃有两个明显的放热峰。 从化学镀沉积生长方式的理论模型出发,探讨了化学镀镍硼合金镀层的生长方式。经试验得出,镀层的纵、横向生长速度之比决定了镀层沉积生长方式。当纵向生长速度高于横向生长速度时,镀层以柱状生长;反之,以粒状方式生长。更多还原

【Abstract】 In this paper, electroless technology had been used to coating Cu,Ni-B on the surface of plastic matrix first, and then to dissolve matrix plastics in solvent to get Ni-B foil. The effect of the bath content of NiCl, KBH4, NH2(CH2)2NH2, Pb(NO3)2 and PH value on the deposition rate were studied, and the microstructure,grain size and properties of prepared Ni-B foil were measured by XRD and TEM.Experiment results show that the electroless and amorphous crystallization technology had been synthesized the Ni-B foil which the average grain size is about 39~47 nm.Ni-B deposition rate was increase followed by decrease with the increased of the content of NiCl, KBH4, NH2(CH2)2NH2, Pb(NO3)2 , and deposition rate was increase with coating temperature.Two novel heat release peaks were appeared at 301℃and 432℃ in the Ni-Balloy containing 2.002wt%B.The growth mode of Ni-B coating has also been studied based on the theory of electroless deposit. The ratio of the growing rate on the transverse direction to the one on the vertical direction is the key factor in determining the growth mode. When the latter rate is greater than the former, the deposit mode conforms to the columnar growth. Otherwise, it conforms to granular or laminar mode. The growth mode will determine the morphology and structure of the coating.更多还原