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射频磁控溅射氧化锌薄膜的制备、改性及光催化性能研究

The Preparation, Modification and Photocatalysis of Zinc Oxide (ZnO) Thin Films by Radio Frequency Magnetron Sputtering

【作者】 任思雨;

【导师】 孙汪典;

【作者基本信息】 暨南大学 , 凝聚态物理, 2005, 硕士

【摘要】 随着地球环境问题的日益严重,利用纳米半导体光催化剂进行环境净化已经引起了广泛的重视。目前的应用主要集中在水和空气的净化和处理方面。然而传统的粉末光催化剂在应用中存在许多缺点,如反应过程中必须搅拌,反应后催化剂难于分离和回收等。而纳米薄膜半导体光催化剂在处理污水过程中不易流失、便于回收、无二次污染,克服了这些缺点,并有着广阔的工业用途。 ZnO是一种具有许多卓越性能的宽禁带Ⅱ-Ⅳ族化合物半导体材料,对于ZnO的催化性能已有一些研究,但由于ZnO自身的光腐蚀作用:ZnO+2h+→Zn2++1/2O2,人们对其研究较少。然而,将ZnO纳米薄膜进行离子注入改性处理,进行贵金属表面修饰,或者制备以ZnO半导体材料为主体的氧化物混合物薄膜,不仅可使ZnO自身的光腐蚀作用减弱,而且也会进一步提高ZnO薄膜的光催化性。 本文利用射频磁控溅射分别制备ZnO薄膜、ZnO-TiO2薄膜、ZnO-SnO2薄膜,并对制备出的ZnO薄膜进行了XRD、AFM、Raman、UV-Vis表征;用离子注入法在磁控溅射制备的ZnO薄膜中分别注入金属Ti离子、V离子,用蒸发镀膜法在磁控溅射制备的ZnO薄膜上蒸发贵金属Ag、Au;研究对比这7种薄膜对苯酚溶液的光催化活性,并找到最佳光催化方案。研究表明:用蒸发镀膜法在磁控溅射制备的ZnO薄膜上蒸发贵金属Ag制备出的ZnO-Ag薄膜在7种方案中具有最佳的光催化活性。

【Abstract】 Since the environment in the whole world deteriorates, using nanometer semiconducotor photocatalysts to purify environment is emphasized. Current applications are focused on the purification and the treatment of water and air. However, there exist many disadvantages in the use of conventional poweder photocatalysts, such as stirring during the process, segregating after the reaction and so on. Nanometer thin film semiconducotor photocatalysts can be used to overcome these disadvantages and extend their industrial application.ZnO is an excellent new type broad band gap II-IV compound semiconductor material.Some works show that the photocatalytic ability of ZnO is higher than that of TiO2, but limited by its photo-induced degradation of itself,ZnO + 2h~+ → Zn2+ +1 / 2O2 , few works have dwelled on the research ofphotocataiysis of ZnO thoroughly. However some researches have found that its photocatalytic ability could have been improved greatly by the surface modifications, implanting with metal ions, modifying with noble metal and coupling with other semiconductors oxides.R.F. Magnetron Sputtering is mostly present method used to prepare ZnO films. In this paper ZnO thin films ZnO-TiO2 thin films and ZnO-SnO2 thin films were successfully fabricated by R.F. Magnetron Sputtering. The preparing details were thoroughly introduced in this paper. With the help of X-ray Diffractometer(XRD), Atomic Force Microscope(AFM), Raman Scattering Spectroscope(RAMAN), UV-Vis Absorption(UV-Vis), we carried out specific studies of the characteristics about ZnO thin films. And , metal ions, V and Ti ions, have been implanted into ZnO thin films prepared by R.F. Magnetron Sputtering. Noble metal, Ag and Au, have been deposited onto ZnO thin films prepared by R.F. Magnetron Sputtering through the PVD method. These seven species thin films have different photocataiysis qualities to degrading phenol solutions, ZnO-Ag thin films, through PVD method deposited Ag onto the ZnO thin films prepared by R.F. Magnetron Sputtering, possess the first rankphotocatalysis quality.

  • 【网络出版投稿人】 暨南大学
  • 【网络出版年期】2005年 08期
  • 【分类号】O614.241
  • 【被引频次】3
  • 【下载频次】653
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