紫外光固化材料表面性能的研究

【作者】 蔡延庆；

【导师】 王德海；

【作者基本信息】 浙江工业大学 ， 材料学， 2005， 硕士

【摘要】 本课题分别研究了不同的固化氛围、温度、基材、固化层数等因素对紫外光固化材料表面能的影响,并通过改变单体稀释剂、引发剂、助剂及其含量来研究所形成材料表面能大小的变化规律。在此基础上,还借助了元素分析、红外反射技术、能谱(XPS)等技术,分析不同固化氛围对紫外光固化材料表面组成、结构及其表面能的影响规律。研究表明: 1、固化材料表面性质与固化氛围有模板性的对应:不同的固化氛围会导致表面固化材料表面具有不同的基团含量。在空气下固化时,氧阻聚效应并不会导致体系中氧的含量增加;而是对应与在氮气中固化下,基团有不同的运动方式,进而导致材料表面的结构、表面能大小等的不同。通过表征分析,在空气下固化时,材料表面极性大、表面能较大。 2、紫外光固化材料的表面温度的改变,并不会导致材料表面中分子之间的色散力和极性力的改变,因而不会改变光固化材料表面能的大小。 3、基材对光固化材料的表面能大小有模板效应,基材的性质将影响紫外光固化材料表面能的大小,如以表面能较大的玻璃为基材时,所得的光固化材料的表面能大于以表面能较小的聚丙稀为基材时所得的产物。 4、紫外光固化材料逐层叠加固化以后,材料的表面能基本保持不变。 5、在空气下固化时,随着厚度的增加,紫外光固化材料表面固化速率增加,使得紫外光固化材料分子调整的时间减小,固化产物所占的体积空间增加,体系密度略小、表面能也略小。 6、添加含有甲基(如POTMPTA)或分子链较长(如HDDA)的单体,更多还原

【Abstract】 The surface properties of UV-cured material were influenced by many factors, which include the curing atmosphere, surface temperature, substrates, layers of UV-cured films and the monomers, photoinitiator, additives in UV-curing material formulation. This paper also reported investigation on films obtained by the epoxy-acrylic resin cured under different atmosphere: nitrogen as inert atmosphere and air, by the Elementary analysis, FTIR - ATR and XPS .The results showed that: 1. The surface properties of films may be affected by the UV-curing atmosphere. The surface energy of the cured coating under air, where oxygen inhibition occured, was greater than that under nitrogen. It was found by the FTIR - ATR and XPS analysis that the films cured under nitrogen exhibits a lower polar character, which is determined by the chemical structure of surface. The reason is that the aptitude of lower surface tension molecule migration to the outer surface of cured film. Because elementary analysis revealed that the total composition of these cured films is similar for a given formulation under both curing atmosphere.2. The dispersive γ~d and polar γ~p components of the surface energy didn’t vary apparently while the material surface temperature rised.3. A clear influence of substrate on polymeric film was observed: it was found更多还原