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丝网印刷磷浆的研制及其扩散特性研究

Research on Screen Printable Phosphorous Paste and Its Diffusion Performance

【作者】 姚朝晖

【导师】 刘祖明; 廖华;

【作者基本信息】 云南师范大学 , 农业生物环境与能源工程, 2004, 硕士

【摘要】 RTP技术和选择性发射极结构是非常有前景的低成本晶体硅太阳电池工业化技术,其掺杂方式主要是用丝网印刷磷浆的方式。本文用聚合物为载体,成功地研制了具有很好稳定性的丝网印刷特性的磷浆,且磷浆浓度可控,印刷时粘度有较宽的适宜范围,热分解比较完全,且比国外的相关产品有更高的pH值,从而减小了对不锈钢丝网的腐蚀性。通过在常规扩散炉和快速扩散炉中使用,可以得到如下结论:1)扩散后方块电阻显示了很好地均匀性和重复性;2)磷浆的杂质浓度、扩散温度、时间对扩散后的表面浓度有影响,扩散时间对结深有影响,这与常规扩散结果一致;3)扩散后易于形成1020cm-3的表面浓度与0.35μm的结深;4)在快速扩散中850℃-925℃下,结深与扩散温度没有明显的相关性,而与扩散时间则成线性关系;5)在快速扩散中应选用与硅吸热系数相近的材料来作为承片物;6)该磷浆扩散的综合性能非常优良,可以用于和RTD技术结合,制备选择性发射极太阳电池。

【Abstract】 Rapid thermal process and selective emitter are promising techniques for fabricating solar cells in mass production, a screen printable paste is used in this process and can reduce the cost without any sacrifice to the performance of the cell. In this paper, we present a preparation method of this screen printable phosphorous diffusion source which is made by adding a polymer solution to the diffusion source and form a stable and transparent compound. This paste has many advantages, such as a wide range for the dopant concentration and decomposed completely when heated, it also has a relatively higher pH value as compared with the relevant product in foreign countries, etc. After diffusion both in the conventional furnace and the RTP furnace, we can draw the following conclusion: 1) The sheet resistance has excellent performance after different diffusion conditions in the two furnace;2) Both the dopant concentration in the phosphorous paste and the diffusion conditions have some influence on the surface concentration(Ns), and the junction depth is only influenced by the diffusion time in the conventional furnace; 3)It can achieve a high dopant concentration under the metal contacts areas after diffusion, and realize a appropriate junction depth and surface concentration to meet the essential needs for a selective emitter;4) between 850 C-925 C in RTP furnace, the junction depth show little relations with the process temperature; and have a direct ratio with the diffusion time;5) in the RTP process, the substrates are not suited for being placed on a material whose heat-absorb coefficient is not the same with the substrates;6) The phosphorous paste has excellent diffusion performance and are suited for fabricating selective emitter combined with RTP process.

  • 【分类号】TM914
  • 【下载频次】462
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