物理气相沉积DLC和TiN系列超硬膜的研究

【作者】 郭武超；

【导师】 余志明；

【作者基本信息】 中南大学 ， 材料学， 2004， 硕士

【摘要】 本文首先对类金刚石膜和TiN系列超硬膜两种多功能涂层的性能，制备及检测手段进行了综合性的描述。在此基础上，采用直流磁控溅射在多晶硅表面沉积了类金刚石的C膜，通过改变沉积基体的温度，溅射功率，沉积气压等实验参数，使得到的C膜呈现出不同的表面形貌；采用多弧离子镀，通过改变沉积的气氛，不同靶材之间的转换的方法，在不锈钢表面分别沉积了TiN／TiAlN／TiN，TiN／TiAlN，TiN／TiNC三种多层膜。利用原子力显微镜(AFM)，X射线衍射仪(XRD)，扫描电镜(SEM)，显微硬度测量仪以及拉伸试验对膜的组织、结构、性能进行了性能检测分析，得到以下结果： 1．工艺参数对直流磁控溅射沉积DLC的表面形貌有明显影响。(1)基体温度越高，DLC膜的表面粗糙度越大，原因是温度的升高增加了C原子表面扩散的能力，表面扩散趋向于生成含高sp~2键结构更接近热力学更加稳定的石墨结构。石墨结构越多，表面越粗糙；(2)溅射功率升高，表面粗糙度降低，原因是当植入离子的能量大于原子的剥离能时，使进入亚表面的C原子增多，表面扩散不易进行，能量波耗散在内部相对大的体积内，同时增加了溅射消移的效果，表面光滑，反之，如果植入的能量达不到一定数值，将主要进行表面扩散，粗糙度增加；(3)沉积气压升高，表面粗糙度增加，这与沉积气压升高增加了入射粒子的碰撞，从而降低了粒子的入射能量有关。 2．TiN/TiAlN／TiN，TiN／TiAlN，TiN／TiNC三种多层膜体系都形成了强烈的(111)面织构。TiN／TiAlN／TiN有最高的硬度，TiN／TiAlN次之，TiN／TiNC最低。这个结果符合E.Bemporad等人提出的模型。对于硬膜软基体体系，表面超硬层对整体的宏观力学性能(抗拉强度和延伸率)没有影响。更多还原

【Abstract】 The properties, preparations, characterizations and applications of diamond like carbon (DLC) film and TiN Superhard films were described briefly at first. Based on this, different surface morphology of diamond-like carbon film was deposited on Si, wafer by controlling the temperature of substrate, ambient pressure, sputtering power in DC magnetron sputtering, using multi-arc ion implantation, TiN’/TiAlN/TiN, TiN/TiAIN, TiN/TiNC multilayer were deposited by changing ambient gas and sputtering target. Atomic force microscope(AFM), X-ray diffraction (XRD), Scanning electron microscope(SEM), tension test was used to tes: these films. By analyzing the results, we made following conclusions: 1. The parameters in the DC magnetron sputtering have evident effect on the morphology of diamond-like carbon film. (1) The elevated temperature lead to a much rougher surface. Surface diffusion is promoted by the increase of temperature. Diffusion in the surface layers of DLC will ter.cto generate ordered clusters with high sp" contents, i. e. with structures closer to the thermodynamically stable graphite phase. More graphite phase the surface has, rougher the surface is; (2)The surface became rougher when the sputtering power increased. When the energy of an impinging ion exceeds the critical value for atomic displacement in the structure, surface diffusion is not promoted and the ion energy tends to be dissipated into a relatively large volume in the interior. The effect of sputtering moving was improved at the same time. The surface became smoother, on the contrary, when the energy of an impinging ion is lower than the critical value, diffusion in the surface is dominating and surface is rougher-, (3) Surface roughness increased with the increase of ambient pressure. It is related with the increase of collision of the im-planted particles which lead to the decease of the energy of the particles. 2. TiN/TiAlN/TiN, TiN/TiAIN, TiN/TiNCall have strong (111) prefertional oritetion. TiN/TiAlN/TiN have the highest hardness, followed by TiN/TiAIN, and TiN/TiNC is the lowest. These results are consistent with the formula proposed by E. Bemporad. For the system of hard film and soft substrate, the superhard films have no influence on the mechanical properties of whole system.更多还原