【作者】 陈逸飞；

【导师】 姜恩永；

【作者基本信息】 天津大学 ， 材料物理与化学， 2004， 硕士

【摘要】 采用射频磁控溅射法制备了具有高饱和磁化强度的 Fe-N 薄膜。系统研究了氮气分压、基底温度，溅射功率等制备工艺条件对 Fe-N 薄膜结构和磁性的影响，以及 Fe-N 薄膜的饱和磁化强度的尺寸效应。 实验结果表明在各种制备工艺条件中氮气分压和基底温度是影响Fe-N薄膜结构和磁性的两个最主要的因素。薄膜中各种Fe-N相的形成强烈的依赖于溅射过程中氮气分压和基底温度的高低。当氮气分压为 2×10-4 Torr，基底温度为 100—150oC时，最有利于高饱和磁化强度α″-Fe16N2相的形成。在此条件下制备的Fe-N薄膜的饱和磁化强度，室温下高达 2179 emu/cc，远高于纯铁的饱和磁化强度值 1714 emu/cc。 实验结果表明，采用射频磁控溅射法制备的具有高α″-Fe16N2相体积含量的Fe-N薄膜的饱和磁化强度随着薄膜厚度的增加先增加，在薄膜厚度为 300 nm处达到其最大值(2179 emu/cc)，在 300—570 nm厚度范围内，饱和磁化强度几乎保持其最大值不变，然后饱和磁化强度又随着薄膜厚度的进一步增加而降低。并对其微观结构随薄膜厚度的变化进行了研究，结果发现，薄膜中晶粒的平均尺寸随着薄膜厚度的增加而增大。更多还原

【Abstract】 The Fe-N thin films with high saturation magnetization were prepared by RFmagnetron sputtering. The effects of preparation conditions on the structures andmagnetic properties of Fe-N films and the relation between the saturationmagnetization and film thickness were investigated in detail. It was found that the nitrogen partial pressure and substrate temperature are thetwo important factors affecting the formation of Fe-N phases and their magneticproperties. The microstructures and magnetic properties are quite diversified atdifferent nitrogen partial pressures and substrate temperatures during the deposition.In our case, nitrogen partial pressure of ~2×10-4 Torr and substrate temperatures of100-150 C are the typical conditions for the formation of α″-Fe16N2 phase with high osaturation magnetization. The room temperature saturation magnetization of theFe-N films deposited under these conditions is as high as 2179 emu/cc, which ismuch higher than that of pure iron, 1714 emu/cc. The saturation magnetization of the FeN films with high α″-Fe16N2 volumefraction initially increases with film thickness and keeps its maximum of about 2179emu/cc in the thickness range of 300-570 nm, and then decreases with furtherincrease in film thickness. Film thickness dependence of microstructure shows thatthe average grain size increases with the increase of film thickness.更多还原