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LIGA技术高深宽比研究
Study on High Aspect Ratio LIGA Process
【作者】 黄军容;
【作者基本信息】 北京工业大学 , 光学工程, 2003, 硕士
【摘要】 本文着眼于LIGA技术高深宽比方面的研究,以提高本实验室用LIGA技术制作微细结构的深宽比为目的,从分析各因素影响深宽比的机理出发,再加以理论设计和实验工艺的优化和改善,分别研究讨论了影响深宽比的几大重要因素:掩模结构和性能、光源光谱和光强、PMMA光刻胶性能、电铸工艺参数等。文中结合本实验室改换LIGA光源的工程,比较分析了3B1束线和3W1束线的能谱差异,针对3B1束线的特点,通过运用XOP、Origin两个软件设计出两组LIGA掩模:Au-PI掩模和Au-Si掩模。并针对3W1光源中硬X光成分较多、光强和功率密度太高的特点,提出了用Ni吸收膜改善光谱和用X光暂波器法优化光强的方法,同时严格控制和改善PMMA光刻胶的性能,经过反复的计算分析和实验改进后,获得了深宽比高达100的胶结构图形。此外,鉴于电铸时易出现影响高深宽比结构制作的气孔、内应力、厚度不均等问题,相应地采取了控制PH值、进行电解处理、添加活性剂、使用第二阴极,及改善电铸电源等方法来进行调整和控制,取得了金属结构深宽比高达30的结果。最后,我们利用LIGA技术加工的独特优点,以发展其高深宽比技术的实际应用,先后制作了狭缝阵列镍结构微推进器关键部件、薄壁网状多孔镍结构正电子慢化体、微型铜结构换热气和多种材料不同、尺寸各异的过滤介质,还结合利用LIGA技术和微细电火花技术的加工优点,制作出了不锈钢微结构
【Abstract】 In this thesis, to increase the aspect ratio of LIGA process, several important influence factors were discussed, which includes the structure and performance of LIGA mask, X-ray intensity and X-ray spectrum of beam lines, the characteristic of PMMA resin and the micro electroforming parameters. The Au-PI mask and the Au-Si mask were designed by XOP and Origin software, after the difference between the spectrum of 3W1 and 3B1 beam line had been contrastively analyzed. Then some methods including optimizing the spectrum and intensity of 3W1 beam line and improving the performance of PMMA were put in force, and PMMA structure with aspect ratio 100 was obtained under these optimum conditions. Moreover, such steps as controlling PH, electrodepositing, using activator and a second cathode, and mending the power supply were taken to solve a series of problems coming into being during electroforming process correspondingly, for example, air holes, inner stress, and ununiformity of deposition. And then, metal structure with aspect ratio 30 was obtained in our laboratory. Eventually, a few micro parts with high aspect ratio were fabricated by LIGA process under the optimum condition. There were key parts of micro thruster, netlike nickel antielectron modulator, micro copper radiator, stainless steel micro components and many filter mediums with different shapes and dimensions
【Key words】 LIGA process; high aspect ratio; mask; spectrum; PMMA; electroforming;
- 【网络出版投稿人】 北京工业大学 【网络出版年期】2003年 03期
- 【分类号】TN405
- 【被引频次】8
- 【下载频次】534