【作者】 朱建勇；

【导师】 梅炳初；

【作者基本信息】 武汉理工大学 ， 材料学， 2002， 硕士

【摘要】 本论文详细地介绍了金刚石薄膜的结构、性质及其应用和常见的几种制备金刚石薄膜的化学气相沉积法。 本文详细介绍了自行研制的2450MHz／5KW带有石英玻璃窗、水冷却不锈钢腔体微波等离子体化学气相沉积（MPCVD）装置。论述了包括微波系统、气路系统、真空系统、检测系统和保障系统等各部分的结构组成及基本功能。 金刚石薄膜的一个重要的应用就是作为窗口材料涂层，但是由于玻璃易于被污染，对于生长高质量的金刚石薄膜是不利的，影响了其应用，而且由于一般的研磨衬底方法对于石英玻璃的成核方法影响不大，更难以生长出高质量的金刚石薄膜，而且由于玻璃中含有较多量的氧元素，对于金刚石薄膜的生长是不利的，因此对于金刚石薄膜在一些领域中限制了其应用潜力。为了得到高质量的金刚石薄膜本研究对于石英玻璃的表面进行了清洗并用了负偏压增强形核的方法。 系统地讨论了在石英玻璃上MPCVD沉积金刚石薄膜的实验过程中，甲烷浓度、沉积气压、气体流量、基体温度等不同实验工艺参数对金刚石薄膜质量的影响。通过实验得到了最佳的工艺参数。 现在国内外的制备方法是为了能够在石英玻璃上生长出金刚石薄膜来，一般都是用某些含碳元素(C₆₀或C₇₀等)在成核期间通过蒸镀的方法来形成一层过渡层来达到促进金刚石生长的目的，因此如何有效的增强形核密度对于金刚石薄膜在石英玻璃上生长是十分重要的。对此，本实验采取了偏压增强形核的方法用自行研制的微波等离子体化学气相沉积（MPCVD）装置对在石英玻璃基体上金刚石的涂层进行了研究。在MPCVD制备得到了金刚石薄膜之后，分别用X衍射（XRD）、扫描电镜（SEM）、拉曼谱（Raman）和光电子能谱（XPS）等测试手段对金刚石薄膜进行了表征，结果表明了生长出来的薄膜的主要成分是金刚石，同时发现了SiC的存在，这表明了用MPCVD在石英玻璃上生长金刚石薄膜时，不是直接生长在SiO₂上，而是有一个过渡层SiC，然后在过渡层上再生长一层金刚石薄膜。更多还原

【Abstract】 This paper introduce the construction, the property, the application of the diamond film , and some familiar preparation method which preparation the diamond film using chemical vapor deposition.The research introduced a domestic microwave plasma chemical vapor deposition (MPCVD) equipment with a quartz glass window and water-cooled stainless steel reaction chamber in 2450MHz/5 Kw. The machineries and function of the sub-systems, including microwave system, gas-route system, vacuum system detecting system, and safeguard system, were also discussed.The important application of diamond film is using the windows materials coat. Because the glass is easy to be stain ,it is very disadvantage to grow high quality diamond film .influence the diamond film application, and like commonly ,rubbing the quartz glass can not improve the nucleus density, so it is very hard to grow high quality diamond film, and the quartz glass contain too much oxygen ,it is very disadvantage to diamond growth. And these limit the diamond film application .In order to grow high quality diamond film ,this experiment using cleanout and negative bias to improve nucleus.Effects of methane concentration, deposition pressure, gas flow rate and substrate temperature on diamond coating on quartz glass by MPCVD were studied systemically. The best parameters were established by experiments.Now ,the most popular method which grow diamond film on quartz glass is using vaporize plate to grow transition layer to improve diamond film growth from contain carbon vapor source (C60 or C70 et al) in the nucleus time all over the world ,so it is important to improve the nucleus density for diamond film grow on the quartz glass. This work using negative bias to improve the nucleus density ,and quartz glass was used as a kind of depositional substrate and diamond was deposited upon it in an MPCVD equipment. The diamond coating was characterized by XRD SEM Rama XPS. The experimental results show that the mostly component of the film is diamond, and the results show that the SiC is exist .It show that the diamond film not grow directly on the quartz glass , there exist the SiC transition layer. And on the transition , diamond film grow.更多还原