【摘要】 针对目前先进制造设备对于高精度平面位移测量的需求，本文提出了一种xz双轴光栅干涉仪，通过偏置分束镜配合直角棱镜反射镜搭建双侧Littrow入射光路结构。分析了出射光束平行性、光束间距与入射光位置、角度之间的关系。实验验证了所提干涉仪的可行性和测量性能，光栅干涉仪在x轴和z轴上分别实现4 nm、7 nm的位移分辨率，经海德曼算法修正后，将周期非线性误差抑制至±5 nm以内。10 mm行程范围内，x轴和z轴分别获得±30 nm和±100 nm的测量精度。最后讨论了由于非共点入射结构所引入的面型误差对测量结果的影响。更多还原

【Abstract】 In response to the current demand for high-precision planar displacement measurements in advanced manufacturing equipment, this paper proposes an xz dual-axis grating interferometer. The system adopts a biaxial Littrow incident light path structure, established using a biaxial beam splitter mirror and rightangled prism mirror. The relationship between the parallelism of the outgoing beam, the beam spacing, and the position and angle of the incident light is analyzed. Experimental results verify the feasibility and measurement performance of the proposed interferometer. The grating interferometer achieves a displacement resolution of 4 nm along the x-axis and 7 nm along the z-axis. After correction using the Heydemann algorithm,the periodic nonlinear error is reduced to ±5 nm. Over a travel range of 10 mm, the measurement accuracies are ±30 nm along the x-axis and ±100 nm along the z-axis, respectively. Finally, the influence of the surface error introduced by the non-coincident incident structure on the measurement results is discussed.更多还原