【摘要】 针对磨料水射流抛光微晶玻璃时喷嘴易堵塞、抛光效率低及表面质量不高等问题，分析其原因为纳米级磨料之间的团聚，本研究拟通过增大磨料表面电荷以及静电排斥作用来抑制纳米磨料的团聚现象。基于DLVO理论和空间位阻理论，通过调节磨料悬浮液的pH值，添加聚乙烯吡咯烷酮（PVP）和十六烷基三甲基溴化铵（CTAB）以提高其分散稳定性；利用Zeta电位仪、激光粒度分析仪分别测量悬浮液的Zeta电位、磨料粒径、悬浮液的图像灰度值等，以评估其分散稳定性。同时，研究悬浮液不同组分及配比对其分散稳定性和材料去除率的影响规律。结果表明：当SiO₂磨料粒径为20～40 nm、磨料质量分数为8%、pH值为9、PVP质量分数为3%、CTAB质量分数为3%时，悬浮液的Zeta电位绝对值达到46 mV，磨料粒径分布于20～40 nm范围，图像灰度值为189，分散稳定性最佳。采用该悬浮液对微晶玻璃工件进行射流抛光后，工件的材料去除率为48 mm³/s，表面粗糙度由原始的17 nm降至0.45 nm。综上，添加pH调节剂、高分子聚合物PVP以及表面活性剂CTAB可有效提高SiO₂磨料悬浮液的分散稳定性。更多还原

【Abstract】 Objectives: In view of the problems that the nozzle is easy to block when polishing glass-ceramic by abrasive water jet, it is easy to lead to low polishing efficiency and low surface quality, and the reason for this problem is the agglomeration caused by the interactions between nano scale abrasives, and the agglomeration phenomenon of nano-abrasives can be solved by increasing the surface charge of the abrasives and electrostatic repulsions. Methods: Based on the DLVO theory and steric hindrance theory, the dispersion stabilities of the abrasive suspensions are improved by adjusting the pH value, adding PVP and CTAB organic additives, and the Zeta potential and abrasive particle size of the suspensions are measured by Zeta potentiometer and laser particle size analyzer, meanwhile the image gray values of the suspensions have been measured to evaluate the dispersion stability of the suspensions. At the same time, the influences of different components and proportions of the suspensions on their dispersion stabilities are studied. Results: The results show that when the particle size of SiO₂ abrasive is 20-40 nm, the mass fraction of abrasive is 8%, the pH value of SiO₂ abrasive suspension is 9, the mass fraction of PVP is 3%, and the mass fraction of CTAB is 3%, the Zeta potential value reaches 46 mV, the particle size of the abrasive is in the range of 20-40 nm, and the gray value of the image is 189, the dispersion stability of the suspension is the best. The glass-ceramic workpiece is jet-polished with this suspension, and the material removal rate of the workpiece is 48 mm³/s, the surface roughness is 0.45 nm, which is reduced significantly compared with the surface roughness of the original workpiece of 17 nm. Conclusions: The addition of pH adjustment, PVP and surfactant CTAB can effectively improve the dispersion stability of SiO₂ abrasive suspension.更多还原