【摘要】 随着先进制造、生物医学与微纳器件等领域对微纳结构加工精度、复杂度和效率要求的不断提升，激光直写技术以其高分辨率、三维自由制造能力和多材料适应性，成为高端微纳制造的重要技术路径。尤其近年来，通过引入多焦点并行曝光、光场调控、功能光刻胶等，激光直写技术正逐步从理论科研走向工程化、产业化。围绕高精度、高通量、光刻胶材料和产业化装备4个方面，系统综述超分辨并行激光直写关键技术与装备的原理、发展概况与应用前景。更多还原

【Abstract】 Significance Super-resolution parallel direct laser writing lithography represents a transformative advancement in micro-nano fabrication, addressing the dual demands of high precision and high throughput that traditional lithographic and additive manufacturing technologies struggle to meet. The method integrates the nonlinear optical effects of two-photon polymerization with innovations in optical field modulation, parallel multi-focus exposure, and advanced photoresist chemistry to achieve sub-10 nm feature sizes and complex 3D freeform structures. Its significance lies not only in overcoming the optical diffraction limit but also in enabling flexible, material-diverse, and maskless fabrication across photonics, biomedicine, and micro-mechanical systems. Compared to conventional semiconductor lithography, super-resolution direct writing laser provides unmatched spatial freedom and scalability, bridging the gap between laboratory-scale nanofabrication and industrial production. This technology thus establishes a foundational platform for nextgeneration high-performance optical devices, microfluidic systems, and metamaterials, marking a pivotal step toward intelligent, high-resolution manufacturing systems.Progress The evolution of this field has proceeded through four main dimensions: resolution enhancement, throughput scaling, materials, and innovation. In precision, early two-photon polymerization(TPP) systems achieved resolutions around 120 nm, later refined to 35 nm through optimization of initiator efficiency and exposure control. Recent studies integrating photoinhibition strategies—such as stimulated emission depletion(STED), triplet-state absorption(TSA), and multi-color peripheral photoinhibition(PPI)—have realized sub-30 nm isotropic features and even 9 nm patterns, effectively surpassing the classical optical diffraction limit. The coupling of dual-step absorption and light-matter co-confinement mechanisms further improves both resolution and energy efficiency, providing reliable nanoscale patterning under low photon flux conditions.On the throughput front, the shift from single-beam scanning to multifocal parallel writing marks a breakthrough. Parallelization via diffractive optical elements(DOEs), spatial light modulators(SLMs), and digital micromirror devices(DMDs) has expanded the number of controllable foci from tens to thousands, allowing the fabrication of millimeter-scale structures within hours instead of days. Hybrid optical architectures integrating acousto-optic deflectors and holographic computation have further enhanced uniformity and flexibility, enabling large-area, stitch-free fabrication of periodic and non-periodic nanostructures. Simultaneously, real-time intelligent control algorithms and high-speed synchronization systems have greatly improved process stability and precision in dynamic writing environments.Photoresist development has also been pivotal. Traditional organic TPP resins have evolved into organic-inorganic hybrids, metal oxide cluster-based formulations, and biodegradable cellulose derivatives, each optimized for higher sensitivity, resolution, and mechanical robustness. Functional resist systems tailored for peripheral photoinhibition or dual-step absorption now enable controllable voxel confinement and suppressed proximity effects, expanding the scope of achievable 3D architectures. Combined with adaptive optics and machine-learning-based beam control, super-resolution parallel laser writing now stands as a flexible, highthroughput nanomanufacturing platform capable of integrating optics, chemistry, and computation.Recent advances in direct laser writing equipment have enabled the industrialization of super-resolution fabrication. Femtosecond two-photon systems from Nanoscribe GmbH, Heidelberg Instruments, and YZQ Instruments achieve sub-50-nm precision and waferscale processing, while UV and deep-UV systems like Mycronic SLX and ALTA 4700 DP deliver high-throughput photomask manufacturing. Multi-focus architectures combining DOE, DMD, and SLM technologies have raised throughput to over 10~8 voxel/s with nanometer accuracy. Intelligent control, grayscale exposure, and adaptive calibration ensure uniformity and repeatability. These developments bridge the gap between experimental nanoscale lithography and scalable industrial production, laying the foundation for next-generation intelligent micro-nano manufacturing.Conclusions and Prospects Super-resolution parallel direct laser writing has matured from a proof-of-concept laboratory technique into an emerging industrially scalable fabrication technology. Its progress reflects the synergistic convergence of ultrafast optics, nonlinear photochemistry, computational holography, and intelligent control systems. The near future will witness the transition from isolated precision experiments to integrated, intelligent manufacturing lines. Key challenges remain, including achieving larger focusarray scalability with independent real-time control, developing next-generation photoresists with enhanced multi-photon absorption cross-sections and environmental stability, and integrating AI-driven control for adaptive correction of optical and process instabilities.更多还原