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Anomalous Hall effect in Bernal tetralayer graphene enhanced by spin–orbit interaction

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【作者】 曲壮壮陈志豪韩香岩王知雨李卓贤刘倩伶赵文俊Kenji WatanabeTakashi Taniguchi程智刚甘子钊路建明

【Author】 Zhuangzhuang Qu;Zhihao Chen;Xiangyan Han;Zhiyu Wang;Zhuoxian Li;Qianling Liu;Wenjun Zhao;Kenji Watanabe;Takashi Taniguchi;Zhi-Gang Cheng;Zizhao Gan;Jianming Lu;State Key Laboratory for Mesoscopic Physics, School of Physics, Peking University;Beijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of Sciences;University of Chinese Academy of Sciences;National Institute for Materials Science;

【通讯作者】 程智刚;路建明;

【机构】 State Key Laboratory for Mesoscopic Physics, School of Physics, Peking UniversityBeijing National Laboratory for Condensed Matter Physics, Institute of Physics, Chinese Academy of SciencesUniversity of Chinese Academy of SciencesNational Institute for Materials Science

【摘要】 Spin–orbit interaction(SOI) can be introduced by the proximity effect to modulate the electronic properties of graphene-based heterostructures. In this work, we stack trilayer WSe2 on Bernal tetralayer graphene to investigate the influence of SOI on the anomalous Hall effect(AHE). In this structurally asymmetric device, by comparing the magnitude of AHE at positive and negative displacement fields, we find that AHE is strongly enhanced by bringing electrons in proximity to the WSe2 layer. Meanwhile, the enhanced AHE signal persists up to 80 K, providing important routes for topological device applications at high temperatures.

【Abstract】 Spin–orbit interaction(SOI) can be introduced by the proximity effect to modulate the electronic properties of graphene-based heterostructures. In this work, we stack trilayer WSe2 on Bernal tetralayer graphene to investigate the influence of SOI on the anomalous Hall effect(AHE). In this structurally asymmetric device, by comparing the magnitude of AHE at positive and negative displacement fields, we find that AHE is strongly enhanced by bringing electrons in proximity to the WSe2 layer. Meanwhile, the enhanced AHE signal persists up to 80 K, providing important routes for topological device applications at high temperatures.

【基金】 Project supported by the National Key R&D Program of China (Grant Nos. 2021YFA1400100 and 2024YFA1409700);the National Natural Science Foudation of China (Grant Nos. 12374168 and T2325026)
  • 【文献出处】 Chinese Physics B ,中国物理B , 编辑部邮箱 ,2025年03期
  • 【分类号】O469
  • 【下载频次】5
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