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微纳米三坐标测量机的技术进展
Advances in micro/nano CMM
【摘要】 超精密器件是国家重大装备与高端仪器的关键组成部分,其几何特征尺寸常介于数百微米至数百毫米之间,而精度要求高达数十至数百纳米。为确保此类器件的质量,必须实现其三维形貌的超精密测量。本文首先综述了微纳米三坐标测量机(Coordinate Measuring Machine, CMM)的研究进展,从整机结构设计、误差补偿技术、纳米测头研制、测量环境控制及整机应用测试等方面进行了系统性归纳。其次,详细介绍了团队历经四代样机的研究成果与最新进展。进而,阐述了一种基于阿贝与布莱恩原则的空间误差建模与补偿创新方法,在此基础上,实现了对尺度小于100μm且具有高深宽比的内尺寸特征的纳米级精度测量。最后,对微纳米三坐标测量机未来的研究方向与应用前景进行了展望。
【Abstract】 In the field of advanced manufacturing, ultra-precision components are indispensable for national key equipment and high-end instruments, including aircraft engine fuel nozzles, precision gears, optical elements, and semiconductor devices. The characteristic dimensions of these components range from hundreds of micrometers to hundreds of millimeters, while the required dimensional accuracy can reach tens to hundreds of nanometers. To guarantee the quality and functional performance of such components, threedimensional ultra-precision measurement is essential. This paper presents a comprehensive review of the development of micro-and nano-coordinate measuring machines(micro/nano CMMs) over the past two decades. The structural designs and measurement principles of micro/nano CMMs are systematically summarized, and key technologies—including error compensation methods, nano-probe design, measurement environment control, and system testing and application—are analyzed in depth. Particular emphasis is placed on the research progress and latest advances in four generations of micro/nano CMM prototypes developed at Hefei University of Technology. Recent work is highlighted, including an innovative volumetric error modeling and compensation method for micro/nano CMMs based on the Abbe and Bryan principles. This method enables nano-precision measurement of internal dimensions with characteristic sizes below 100 μm and large depth-to-width ratios. Finally, future research directions and potential application prospects of micro/nano CMMs in ultra-precision manufacturing are discussed.
【Key words】 precision measurement; Micro-Electro-Mechanical System(MEMS); Coordinate Measuring Machine(CMM); high aspect ratio structures; nano probe; Abbe error; volumetric error compensation;
- 【文献出处】 光学精密工程 ,Optics and Precision Engineering , 编辑部邮箱 ,2025年23期
- 【分类号】TH721
- 【下载频次】85