【摘要】 为提升磁流变抛光的励磁性能及加工质量，提出一种基于Halbach阵列的永磁体排列方式，并分析工艺参数对K9玻璃抛光性能的影响规律。通过磁场仿真对比Halbach阵列与传统N-S极交替阵列及内外交替阵列的磁场强度、磁通密度模、梯度分布及羰基铁粉受力情况；结合单因素实验，探讨工件转速、磁场转速、工作间隙及励磁间隙对表面粗糙度和材料去除率的影响规律。Halbach阵列扩大磁场有效作用面积，保持良好均匀性，提高磁场强度及磨粒受力，展现优越励磁性能；工件转速、磁场转速和工作间隙增加时，表面粗糙度呈先降后升，材料去除率先升后降；励磁间隙增大则导致粗糙度持续升高、材料去除率下降。在工件转速650 r/min、磁场转速70 r/min、工作间隙1.2 mm、励磁间隙4 mm及抛光30 min条件下，K9玻璃表面粗糙度达到0.029 7μm，材料去除率为51.928 nm/min。Halbach阵列励磁方式及其抛光工艺有效提升了磁流变抛光性能。更多还原

【Abstract】 To enhance the excitation performance and processing quality of magnetorheological polishing, a Halbach array-based permanent magnet arrangement is proposed, and the influence of process parameters on the polishing performance of K9 glass is investigated. Magnetic field simulations were conducted to compare the Halbach array, traditional N-S pole alternating array, and inner-outer alternating array in terms of magnetic field strength, magnetic flux density magnitude, gradient distribution, and the force acting on carbonyl iron particles. Combined with single-factor experiments, the effects of workpiece rotation speed, magnetic field rotation speed, working gap, and excitation gap on surface roughness and material removal rate were systematically studied. The results indicate that the Halbach array expands the effective acting area of the magnetic field, maintains good uniformity, and enhances both magnetic field strength and abrasive particle force, thereby exhibiting superior excitation performance. With increasing workpiece rotation speed, magnetic field rotation speed, and working gap, the surface roughness decreases initially and then increases, while the material removal rate increases at first and then decreases. As the excitation gap increases, the surface roughness keeps rising and the material removal rate declines. Under the conditions of a workpiece rotation speed of 650 r/min, magnetic field rotation speed of 70 r/min, working gap of 1. 2 mm, excitation gap of 4 mm, and a polishing duration of 30 min, the surface roughness of K9 glass reaches 0. 029 7 μm, and the material removal rate is 51. 928 nm/min. The Halbach array excitation method and its corresponding polishing process effectively improve the performance of magnetorheological polishing.更多还原