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镜片面形误差与法珀标准具性能指标的关系

Relationship between mirror surface figure errors and performance metrics of Fabry-Pérot etalons

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【作者】 于涵江毅

【Author】 YU Han;JIANG Yi;School of Optics and Photonics, Beijing Institute of Technology;

【通讯作者】 江毅;

【机构】 北京理工大学光电学院

【摘要】 为了对法布里-珀罗标准具镜片加工过程中的面形误差进行确定性控制,本文深入研究镜片面形误差与法珀标准具性能的关系。通过建立面形误差对标准具透射谱影响的理论模型,量化分析面形误差对标准具主要性能指标的影响,进而优化工艺与面形控制参数。研究发现,面形误差的均值与标准具透射谱峰中心波长呈现良好线性关系,理论推导得出中心波长偏移的灵敏度系数为1.65 pm/nm。面形误差的峰谷值影响标准具透射谱线带宽展宽与峰值透过率衰减程度,在峰谷值小于λ/40(15.8 nm)时,带宽与峰值透过率渐进收敛。为验证理论模型,搭建皮米级精度的标准具透射谱测试实验系统,通过通光孔径测试的定性验证与面形误差测试的定量分析,明确中心片面形均匀性对标准具性能的影响高于边缘片,制定满足性能指标的面形误差控制阈值,并据此开展标准具研制实验。实验结果表明,在中心片峰谷值控制在10 nm内时,直径30 mm的标准具峰值透过率达到了98.63%,且在中心波长532.199 nm处实现带宽为32.8 pm的窄带滤波,逼近理论设计极限。本文这一结论对高透过率、窄带宽、中心波长皮米级稳定的高精密标准具的生产加工具有重要应用价值。

【Abstract】 To achieve deterministic control of surface figure errors in the fabrication of Fabry-Pérot etalon mirrors, this study thoroughly investigated the relationship between mirror surface figure errors and the performance of etalons. A theoretical model was established to analyze the impact of surface figure errors on the transmission spectrum of the etalon, quantitatively revealing the effects of different surface profiles on key performance parameters, thereby optimizing manufacturing processes and surface control parameters. The research showed that the mean value of surface figure errors had a strong linear correlation with the central wavelength shift, with a sensitivity coefficient of 1. 65 pm/nm that was theoretically derived. The peak-to-valley value of surface figure errors affected the spectral linewidth broadening and peak transmittance attenuation. Within the region where the peak-to-valley value was less than λ/40(15. 8 nm), both linewidth and peak transmittance gradually converged. To validate the theoretical model, a transmission spectrum test system with picometer-level accuracy was constructed. Through qualitative validation via clear aperture testing and quantitative analysis of surface figure errors, it was determined that the surface uniformity of the central plate exerted a greater influence on etalon performance than that of the edge plates. A critical surface figure error control threshold satisfying the performance specifications was established, guiding etalon fabrication experiments. Results demonstrate that for a 30 mm-diameter etalon with the peak-tovalley value controlled within 10 nm, the peak transmittance reaches 98. 63%, achieving narrowband filtering with a bandwidth of 32. 8 pm at the central wavelength of 532. 199 nm, which approaches the theoretical design limit. These conclusions hold significant application value for manufacturing high-precision etalons with high transmittance, narrow bandwidth, and picometer-level central wavelength stability.

【基金】 国家自然科学基金-航天科技集团企业联合重点项目(No.U20B2057)
  • 【文献出处】 光学精密工程 ,Optics and Precision Engineering , 编辑部邮箱 ,2025年14期
  • 【分类号】TH74
  • 【下载频次】4
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