【摘要】 本文采用磁控溅射技术制备钼（Mo）薄膜，通过X射线衍射、扫描电子显微镜、紫外-可见分光光度计和四探针电阻率测试仪研究了沉积气压和衬底温度对薄膜结构、光学及电学性能的影响．结果表明，随着沉积气压的升高，Mo薄膜的结晶性降低，反射率和电阻率升高．随衬底温度的升高，不同沉积气压制备的Mo薄膜有不同表现．低气压（0.2 Pa）制备的Mo薄膜结晶性、反射率和电阻率变化不大，而高气压（5 Pa）制备的Mo薄膜随衬底温度的升高，结晶性变好，电阻率下降．最终，在5 Pa、100℃和0.2 Pa、300℃条件下制备的双层Mo薄膜上制备了Sb₂Se₃薄膜太阳电池器件，光电转换效率为5.1%.更多还原

【Abstract】 In this study, Mo films were fabricated by magnetron sputtering. The influence of deposition pressure and substrate temperature on the structural properties, reflectance and resistivity were studied by X-ray diffraction（XRD）, scanning electron microscopy（SEM）, UV-Vis spectrophotometer and four-probe resistivity tester. The results show that as the deposition pressure increased, the crystallization of Mo films gradually deteriorated,and the reflectance and resistivity gradually increased. As the deposition temperature increased, the Mo films fabricated at different deposition pressures showed different characterization. At low deposition pressure（0.2 Pa）,the structure, reflectance and resistivity showed negligible changes when the substrate temperature increased. On the other hand, at high deposition pressure（5 Pa）, the crystallization improved and the resistivity decreased as the substrate temperature increased. Finally, the Sb₂Se₃ solar cells deposited on the double-layer structured Mo contacts with the first layer deposited at 5 Pa, 100 ℃ and the second layer deposited at 0.2 Pa, 300 ℃ showed a power conversion efficiency of 5.1%.更多还原