【摘要】 本文开展了对单晶硅小闪耀角光栅的各向异性湿法刻蚀制备工艺研究，制备了适用于软X射线中波波段的闪耀光栅，以满足国家同步辐射光源的需要。首先，基于严格耦合波法对小闪耀角光栅进行了结构参数优化及工艺容差分析。在晶向对准过程中，先通过环形预刻蚀确定硅片晶向，再基于倍频调整法实现光栅掩模与单晶硅<111>晶向的对准。研究了光刻胶灰化技术及活性剂对光栅槽形质量的影响，并通过单晶硅各向异性湿法刻蚀工艺成功制备了接近于理想锯齿槽形的闪耀光栅。实验结果证明：所制备光栅闪耀角为1°，刻线密度为1 200 gr/mm，闪耀面均方根粗糙度在0.5 nm以内。此方法可以应用于软X射线中波波段闪耀光栅的制作，在获得较高衍射效率的同时可以大大减少制作难度及成本。更多还原

【Abstract】 In order to meet the requirements of the national synchrotron radiation source, the anisotropic wetetching technology of monocrystalline silicon grating with small blazed angle is studied, and the blazed grating suitable for the medium wave soft X-ray band is prepared. Based on the rigorously coupled wave theory,the structural parameters and process tolerance of the small blazed angle grating are designed. In the crystal alignment process, the crystal orientation of the silicon wafer is determined by ring-preetching, and then the grating mask is aligned with the crystal direction of monocrystalline silicon <111> based on the frequency doubling adjustment method. At the same time, the effect of the photoresist ashing technique and the active agent on the groove quality of the grating is investigated, and the scintillating gratings close to the ideal sawtooth groove shape are successfully prepared by the monocrystalline silicon anisotropic wet etching process.The experimental results show that the blazed angle of the prepared grating is 1°, the linear density is1 200 gr/mm, and the root mean square roughness of the blazed surface is less than 0.5 nm. This method can be applied to the fabrication of the medium wave soft X-ray blazed grating, which can greatly reduce the difficulty and cost of fabrication while achieving high diffraction efficiency.更多还原