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脉冲频率对高脉冲磁控溅射Cr/C镀层组织结构和耐蚀性的影响
Effect of Pulse Frequency on the Microstructure and Corrosion Resistance of High Pulse Magnetron sputtering Cr/C coatings
【摘要】 为研究磁控溅射脉冲频率对镀层组织结构和耐蚀性的影响,以200、300、400、500和600 Hz脉冲频率下制备的Cr/C镀层为对象,采用XRD、SEM、电化学工作站对其相组成、微观组织和耐蚀性进行了表征分析。结果表明:不同脉冲频率下制备的Cr/C镀层相组成相同,均为Cr7C3;Cr/C镀层的表面形貌均为菜花状颗粒,截面组织均为柱状晶;随着脉冲频率的增加,Cr/C镀层的组织变粗,柱状晶之间的空隙增大,致密性降低,表面粗糙度增加,镀层的厚度增大,镀层的平均沉积速率从18.45 nm·min-1增大到28.08 nm·min-1;脉冲频率为500 Hz时镀层的腐蚀电位最高、腐蚀电流最低,腐蚀速率仅为0.002 96 mm·a-1。
【Abstract】 In order to study the effect of magnetron sputtering pulse frequency on the microstructure and corrosion resistance of Cr/C coatings prepared at 200, 300, 400, 500 and 600 Hz, the phase composition, microstructure and corrosion resistance are analyzed by XRD, SEM and electrochemical workstation. The results show that the phase composition of Cr/C coatings prepared under different pulse frequencies is the same, all of which are Cr7C3. The surface morphology of Cr/C coatings is cauliflower particles, and the cross-section structure is columnar crystal. With the increase of pulse frequency, the microstructure of Cr/C coating becomes coarser, the gaps between the columnar crystals increases, the densification decreases, the surface roughness increases, the thickness of the coating increases, and the average deposition rate of the coating increases from 18.45 nm·min-1 to 28.08 nm·min-1. When the pulse frequency is 500 Hz, the corrosion potential of the coating is the highest, the corrosion current is the lowest, and the corrosion rate is only 0.002 96 mm·a-1.
【Key words】 pulse magnetron sputtering; pulse frequency; Cr/C coating; microstructure; corrosion resistance;
- 【文献出处】 西安航空学院学报 ,Journal of Xi’an Aeronautical Institute , 编辑部邮箱 ,2024年03期
- 【分类号】TG174.4
- 【下载频次】4