【摘要】 在铜化学机械抛光中，由于典型缓蚀剂苯并三氮唑(BTA)对铜表面化学保护作用非常强烈，造成铜去除速率过低的现象。为了获得更好的缓蚀效果和铜表面质量，在近中性溶液中，对BTA缓蚀剂和新型缓蚀剂2,2′-[[(甲基-1H-苯并三唑-1-基)甲基]亚氨基]双乙醇-(TT-LYK)的缓蚀效果进行比较，并对2种缓蚀剂的复配效果进行研究。结果表明：在近中性溶液中，BTA和TT-LYK均可以有效抑制铜表面腐蚀；2种缓蚀剂复配后具有协同作用，添加到抛光液中可得到更好的铜表面质量和更低的粗糙度，这可能是由于2种缓蚀剂的钝化膜类别相似，使得在一种缓蚀剂形成配合物的基础上，另一种缓蚀剂对生成的钝化膜进行补充，使得双层钝化膜更致密，能更好地保护铜表面不受腐蚀。更多还原

【Abstract】 In copper chemical mechanical polishing, the typical corrosion inhibitor benzotriazole(BTA) has a strong chemical protection effect on the copper surface, resulting in a low copper removal rate.In order to achieve better corrosion inhibition effect and copper surface quality, the corrosion inhibition effects of BTA corrosion inhibitor and novel inhibitor of ethanol, 2,2′-[[(methyl-1H-benzotriazol-1-yl) methyl] imino] bis-(TT-LYK) in near-neutral solutions were compared.The mixed inhibition of these two inhibitors was also investigated.The results show that both of the corrosion inhibitors can effectively inhibit copper surface corrosion in near-neutral solutions.The combination of two corrosion inhibitors has a synergistic effect, and adding them to the polishing solution can achieve better copper surface quality and lower roughness.This may be due to their similar types of passivation films formed, which enables another inhibitor can supplement the passivation film generated by one inhibitor, resulting a denser and better protective dual-layer passive film on the metal surface.更多还原