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面向晶圆划刻的兆声辅助激光加工实验研究

Experimental Study of Megasonic Assisted Laser Processing for Wafer Scribing

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【作者】 翟科王一帆杨子昊田恩宝薛寒杜立群

【Author】 ZHAI Ke;WANG Yifan;YANG Zihao;TIAN Enbao;XUE Han;DU Liqun;College of Quality and Technical Supervision,Hebei University;State Key Laboratory of High-performance Precision Manufacturing,School of Mechanical Engineering,Dalian University of Technology;

【通讯作者】 杜立群;

【机构】 河北大学质量技术监督学院大连理工大学机械工程学院,高性能精密制造全国重点实验室

【摘要】 针对晶圆划刻中激光加工易产生重铸层且得到的沟槽深宽比小等问题,提出了兆声辅助激光加工方法,对激光烧蚀与兆声振动理论进行分析,并利用响应面分析法对加工参数进行优化。结果表明,兆声波能够将烧蚀产生的液相材料和熔融碎屑击出烧蚀区,从而减小重铸层面积,改善晶圆的表面形貌;附加兆声辅助后,沟槽划刻后晶圆表面重铸层面积减小约25%,烧蚀深宽比由2.65增加到3.82。基于上述研究,在晶圆表面划刻得到了形貌良好的网格结构,证明此方法能有效改善晶圆划刻的表面形貌,减少重铸层的产生,提高晶圆划刻的效率与精度。

【Abstract】 Facing the demand of wafer scribing,a megaacoustic assisted laser processing method was proposed to address the issues of easy generation of recast layers and low depth to width ratio of grooves. The theory of laser ablation and megaacoustic vibration was analyzed,and the response surface analysis method was used to optimize the processing parameters. The result showed that megasonic waves can knock out the liquid phase materials and molten debris generated by ablation from the ablation zone,thereby reducing the area of the recast layer and improving the surface morphology of the wafer. After adding megasound assistance,the area of the recast layer on the wafer surface decreased by25% after groove etching,and the ablation depth to width ratio increased from 2.65 to 3.82. Based on the above research,a well shaped grid structure was obtained by etching on the surface of the wafer,proving that this method can effectively improve the surface morphology of wafer etching,reduce the generation of recast layers,and improve the efficiency and accuracy of wafer etching.

【基金】 国家重点研发计划项目(2022YFB4601602);河北省自然科学基金项目(E2022201028)
  • 【文献出处】 电加工与模具 ,Electromachining & Mould , 编辑部邮箱 ,2024年04期
  • 【分类号】TQ127.2;TN249
  • 【下载频次】22
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