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Self-Oscillated Growth Formation of Standing Ultrathin Nanosheets out of Uniform Ge/Si Superlattice Nanowires

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【作者】 甘鑫安钧洋王军转刘宗光徐骏施毅陈坤基余林蔚

【Author】 Xin Gan;Junyang An;Junzhuan Wang;Zongguang Liu;Jun Xu;Yi Shi;Kunji Chen;Linwei Yu;School of Electronic Science and Engineering/National Laboratory of Solid-State Microstructures,Nanjing University;

【通讯作者】 王军转;余林蔚;

【机构】 School of Electronic Science and Engineering/National Laboratory of Solid-State Microstructures,Nanjing University

【摘要】 Self-oscillation is an intriguing and omnipresent phenomenon that governs a broad range of growth dynamics and formation of nanoscale periodic and delicate heterostructures. A self-oscillating growth phenomenon of catalyst droplets, consuming surface-coating a-Si/a-Ge bilayer, is exploited to accomplish a high-frequency alternating growth of ultrathin crystalline Si and Ge(c-Si/c-Ge) nano-slates, with Ge-rich layer thickness of 14–19 nm,embedded within a superlattice nanowire structure, with pre-known position and uniform channel diameter. A subsequent selective etching of the Ge-rich segments leaves a chain of ultrafine standing c-Si nanosheets down to ~ 6 nm thick, without the use of any expensive high-resolution lithography and growth modulation control.A ternary-phase-competition model has been established to explain the underlying formation mechanism of this nanoscale self-oscillating growth dynamics. It is also suggested that these ultrathin nanosheets could help to produce ultrathin fin-channels for advanced electronics, or provide size-specified trapping sites to capture and position hetero nanoparticle for high-precision labelling or light emission.

【Abstract】 Self-oscillation is an intriguing and omnipresent phenomenon that governs a broad range of growth dynamics and formation of nanoscale periodic and delicate heterostructures. A self-oscillating growth phenomenon of catalyst droplets, consuming surface-coating a-Si/a-Ge bilayer, is exploited to accomplish a high-frequency alternating growth of ultrathin crystalline Si and Ge(c-Si/c-Ge) nano-slates, with Ge-rich layer thickness of 14–19 nm,embedded within a superlattice nanowire structure, with pre-known position and uniform channel diameter. A subsequent selective etching of the Ge-rich segments leaves a chain of ultrafine standing c-Si nanosheets down to ~ 6 nm thick, without the use of any expensive high-resolution lithography and growth modulation control.A ternary-phase-competition model has been established to explain the underlying formation mechanism of this nanoscale self-oscillating growth dynamics. It is also suggested that these ultrathin nanosheets could help to produce ultrathin fin-channels for advanced electronics, or provide size-specified trapping sites to capture and position hetero nanoparticle for high-precision labelling or light emission.

【基金】 supported by the National Natural Science Foundation of China (Grant Nos. 92164201, 61921005, 61974064, 61934004, and 11874198)
  • 【文献出处】 Chinese Physics Letters ,中国物理快报(英文版) , 编辑部邮箱 ,2023年06期
  • 【分类号】TB383.1
  • 【下载频次】4
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