【摘要】 化学气相沉积(CVD)法是目前制备C/C复合材料的首选方法，沉积炉内流场的均匀性直接影响目标产物的质量及产量。本文建立了CVD法制备C/C复合材料的沉积炉内气体流动仿真模型，采用计算流体力学方法对沉积炉内流场进行模拟，并研究主要工艺参数对沉积炉内流场分布的影响规律。结果表明，产品区域气体呈现低速均匀的流动特征，真空度增大会导致沉积炉内气体流速显著增加，但对流场均匀性几乎无影响；采用各路相同的送气方式时沉积炉内流场分布比中心增大的送气方式更均匀；较小进气量可以使沉积炉内流场更均匀。更多还原

【Abstract】 Chemical vapor deposition(CVD) is the preferred method to prepare C/C composites.The uniformity of the flow field in the deposition furnace directly affects the quality and yield of the target products.In this paper, a simulation model of gas flow in a deposition furnace for C/C composites prepared by CVD method was established, the flow field in the deposition furnace was simulated by computational fluid dynamics method, and the influence of main process parameters on the distribution of the flow field in the deposition furnace was studied.The results show that the gas flow in the product area is low speed and uniform.The gas flow rate in the deposition furnace increases significantly with the increase of vacuum degree, but the flow field uniformity has little influence.The distribution of the flow field in the depositional furnace is more uniform when the same pumping mode is adopted.Smaller intake gas can make the flow field in the deposition furnace more uniform.更多还原