【摘要】 为了实现半导体纳米材料的高效安全制备，结合不同材料的生长要求，设计并搭建了一套常压/低压一体化CVD生长系统。该生长系统主要由管式生长炉、配气单元和尾气回收处理单元三部分构成。系统配置单温区、双温区和三温区管式炉，采用机械泵/分子泵与高精度真空计准确调控管内压强，可实现不同压强条件下多种半导体纳米材料的高效制备；安装了可燃气体自动探测、报警、断气一体化装置，增加了阻火防燃、泄气防爆等装置，可有效提高系统的安全性。该生长系统具有操作简单、功能多样、安全可靠等优点，应用此系统已成功生长出二十余种高质量的新型半导体纳米材料，取得了一系列重要学术成果。更多还原

【Abstract】 In order to realize the efficient and safe preparation of semiconductor nanomaterials, an atmospheric/low pressure integrated CVD growth system is designed and built to satisfy requirements of different materials. The growth system is mainly composed of three parts, i.e., tubular growth furnace, gas distribution unit and tail gas recovery and treatment unit. Tubular furnaces with single temperature zone, double temperature zone and triple temperature zone are configured, and mechanical pump/molecular pump and high-precision vacuum gauge are used to accurately control the pressure in the tube, which can realize the efficient preparation of various semiconductor nanomaterials under different pressure conditions. The integrated device of automatic detection, alarm and gas cut-off of combustible gas is installed, and the devices of fire prevention and explosion prevention are added, which can effectively improve the safety of the system. The growth system has the advantages of simple operation, multiple functions, safety and reliability, etc. More than 20 kinds of high-quality new semiconductor nanomaterials have been successfully grown by using this system, and a series of important academic achievements have been achieved.更多还原