【摘要】 硅晶片电镀产生的废水中镍离子含量较高，具有很好的回收价值。本文采用工业上常用的P204 (二(2-乙基己基)磷酸酯)和P507(2-乙基己基膦酸单-2-乙基己基酯)作为萃取剂，用盐酸调节碱性电镀废水的pH值，研究了水相pH值、温度、振荡时间、萃取剂浓度、稀释剂种类等因素对萃取电镀废液中镍离子的影响。皂化P204萃取剂萃取能力远高于P507,控制适当的条件利用P204可以实现电镀废液中镍的回收。更多还原

【Abstract】 The content of nickel ions in wastewater produced by electroplating of silicon wafers is high, which has good recovery value. In this paper, P204(bis(2-ethylhexyl) phosphate) and P507(2-ethylhexyl phosphonate mono-2-ethylhexyl) were used as extractants. The pH of alkaline electroplating wastewater was adjusted with hydrochloric acid. The effects of aqueous pH,temperature, oscillation time, extractant concentration and diluent type on the extraction of nickel ions in electroplating waste solution were studied. The extraction capacity of saponified P204 extractant is much higher than that of P507,and the recovery of nickel from electroplating waste liquid can be realized by controlling appropriate conditions with P204.更多还原