【摘要】 针对当前传统游离磨料抛光蓝宝石衬底存在的磨粒轨迹不可控、抛光液污染环境等问题，文章基于半固结柔性抛光工具探究了磨料反应活性及不同绿色络合剂对抛光蓝宝石衬底性能的影响。通过水解沉淀法制备了高活性纳米二氧化硅磨料，分别以木糖醇、甘露醇和三异丙醇胺作为络合剂配制绿色环保型抛光液，基于半固结柔性抛光工具进行加工试验。结果表明，高活性二氧化硅磨料的材料去除率达到1 nm/min,较商用二氧化硅提升了81.8%,表面粗糙度降低了10.5%。同时，相较于甘露醇、三异丙醇胺，当抛光液组分中的络合剂为木糖醇时，蓝宝石衬底表面粗糙度分别降低了33.7%和24%,PV值小于18 nm,材料去除率分别提升了24%和5.1%。高活性二氧化硅磨料和木糖醇络合剂可提高蓝宝石衬底加工过程中的界面反应速率，从而提升了表面质量和加工效率，实现了蓝宝石衬底超光滑、高效率、无污染抛光。更多还原

【Abstract】 Regarding the problems of uncontrollable abrasive trajectory and environmental pollution of the poli-shing slurry that exists in the traditional free abrasive polishing of sapphire substrates, this study explores the effects of abrasive chemical reactivity and different green complexing agents on the polishing performance for substrates based on semi-fixed flexible polishing tools. Highly active nano-silica abrasives were prepared by the hydrolytic precipitation method. Green environment-friendly polishing slurry was prepared by using xylitol, mannitol and triisopropanolamine as complexing agents respectively. Subsequently, on a semi-solidified flexible po-lishing tool, machining tests were conducted. Results show that the material removal rate(MRR) of the highly active silica abrasive reaches as high as 1 nm/min, which is 81.8% higher than that of commercial silica, and the surface roughness is reduced by 10.5%. Meanwhile, compared with mannitol and triisopropanolamine, when xylitol is used as the complexing agent in the polishing slurry, the surface roughness of the sapphire substrate is reduced by 33.7% and 24% respectively, the PV value is less than 18 nm, and the material removal rate was improved by 24% and 5.1% respectively. The interfacial reaction rate during polishing can be accelerated with the highly reactive silica abrasive and xylitol complexing agent, thereby improving the surface quality and processing efficiency, realizing ultra-smooth, high-efficiency and pollution-free polishing of sapphire substrates.更多还原