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Electron sheaths near a positively biased plate subjected to a weak electron beam
【摘要】 Electron sheaths have previously only been measured near a positively biased small electrode, in which a potential dip was often observed. In this paper, we present an experimental study on the electron sheath near a stainless steel plate in the presence of a weak electron beam. It is shown that the electron beam, though its density is much lower than that of the background plasma, will substantially alter the sheath structure, i.e., it causes the disappearance of the potential dip when the beam energy just exceeds the ionization potential of the neutral gas but later enhances the dip for higher energies. It is also shown that proper biases on the plate and chamber wall are the key to the formation of the electron sheath and the dip. For a fixed plate bias but with different electron beam energy, the measured thickness of the ion-free Child–Langmuir sheath agrees well with that of the theoretical model.
【Abstract】 Electron sheaths have previously only been measured near a positively biased small electrode, in which a potential dip was often observed. In this paper, we present an experimental study on the electron sheath near a stainless steel plate in the presence of a weak electron beam. It is shown that the electron beam, though its density is much lower than that of the background plasma, will substantially alter the sheath structure, i.e., it causes the disappearance of the potential dip when the beam energy just exceeds the ionization potential of the neutral gas but later enhances the dip for higher energies. It is also shown that proper biases on the plate and chamber wall are the key to the formation of the electron sheath and the dip. For a fixed plate bias but with different electron beam energy, the measured thickness of the ion-free Child–Langmuir sheath agrees well with that of the theoretical model.
【Key words】 electron sheath; potential dip; electron-beam-plasma system;
- 【文献出处】 Plasma Science and Technology ,等离子体科学和技术(英文版) , 编辑部邮箱 ,2023年03期
- 【分类号】O53
- 【下载频次】3