节点文献
Cu-Co-Si系低Si侧扩散行为研究
Diffusion behavior in the low Si region of a Cu-Co-Si system
【摘要】 本文采用固-固扩散偶技术,利用扫描电子显微镜(SEM)和能谱分析仪(EDS)对CuCo-Si系扩散偶的微观结构和成分分布等扩散行为进行了研究。结果表明,1000℃时扩散偶Co94Si6-Cu94Si6和Co90Si10-Cu94Si6均呈层状结构,均由Cu基固溶体、金属间化合物Co2Si和Co基固溶体三个单相层组成; 700℃时扩散偶Co94Si6-Cu94Si6的层状结构则是由Cu基固溶体、金属间化合物CoSi、金属间化合物Co2Si和Co基固溶体四个单相层组成。扩散偶的扩散路径均偏向Co-Si侧;且扩散路径在两相区与共轭线平行。随Si元素含量的增加,Cu原子在Co基固溶体中的扩散速度加快。
【Abstract】 The diffusion structure and composition distribution of the solid-to-solid diffusion-couples in a Cu-Co-Si system were investigated by Scanning Electron Microscopy( SEM) and Energy Dispersive Spectrometer( EDS). The results show that the diffusion-couples Co94Si6-Cu90Si6 and Co90Si10-Cu90Si6 are both layered at 1000℃,and are composed of three single-phase layers: Cu-based solid solution,intermetallic compound Co2Si and Co-based solid solution. The layered structure of diffusion-couple Co94Si6-Cu90Si6 at 700℃ is composed of four single-phase layers: Cu-based solid solution,intermetallic compound CoSi,intermetallic compound Co2Si and Co-based solid solution. The diffusion paths of the diffusion-couples are biased towards the Co-Si side and they are parallel to the tie-lines in the two-phase regions. With the increase of Si elemental content,the diffusion rate of Cu atoms in Cobased solid solutions accelerates.
【Key words】 Cu-Co-Si system; diffusion behavior; solid-to-solid diffusion couple; diffusion path;
- 【文献出处】 中国体视学与图像分析 ,Chinese Journal of Stereology and Image Analysis , 编辑部邮箱 ,2022年03期
- 【分类号】TG146.11
- 【下载频次】11