【摘要】 湿法工艺作为半导体工艺的重要组成部分，通过化学品(酸、碱、溶剂等)与超纯水等液体介质，对晶圆表面进行刻蚀、清洗等处理，其制程需避免颗粒、金属、离子、细菌等污染物带来的工艺缺陷。为此，湿法工艺相关的化学品系统、超纯水系统与制程装备均需采用超洁净流控部件，但相关产品被国外垄断，我国对该技术领域的研究仍处起步阶段。该研究首先阐述了半导体湿法制程对超洁净流控部件的需求，剖析了该类部件的主要技术特征。进而，重点介绍了磁悬浮泵、波纹管泵、隔膜阀以及超声波流量传感器等超洁净流控部件的工作原理与发展历程，并分析了其关键技术与研究现状。最后，对超洁净流控技术的发展做出了展望。更多还原

【Abstract】 Wet processing(etching and cleaning, etc.) in the semiconductor fabrication treats the wafer surface through chemical liquids such as(acid, alkali, solvent, etc.) and ultrapure water. The above processes need to avoid the defects caused by particles, metals, ions, bacteria and other contaminants. Therefore, the chemical and ultrapure water delivery systems, as well as the process equipment, need to use ultra-clean flow control parts, which are still monopolized by foreign countries and according research in China is still in its infancy. This review paper firstly describes the requirements of ultra-clean flow control parts for the wet process, and then analyzes their main technical characteristics. Furthermore, the working principle and development history of several typical parts including magnetic levitation pump, bellows pump, diaphragm valve and ultrasonic flow sensor are introduced. Their key technologies and according research status are also analyzed. Finally, the future development of the technology is prospected.更多还原