【摘要】 随着超短超强自由电子激光等光源的应用，极紫外、X射线波段薄膜反射镜的抗辐照性能备受关注。本文介绍了IPOE实验室搭建的纳秒极紫外辐照损伤装置，并对极紫外-X射线自由电子激光常用的B4C薄膜反射镜、Au和Ru金属单层膜反射镜、B4C/Ru双层膜反射镜以及极紫外光刻用Mo/Si多层膜反射镜开展了辐照损伤测试，获得了不同材料和结构的薄膜反射镜抗损伤性能，结合理论模拟揭示了热熔融、热应力和膜层间扩散反应等损伤机制的作用。更多还原

【Abstract】 Owing to an increased application of novel light sources such as ultra-short and ultra-intense free electron lasers(FEL),damage resistance of extreme ultraviolet(EUV)and X-ray thin-film mirrors has attracted wide attention. This paper introduces a nanosecond EUV damage instrument manufactured by the Institute of Precision Optical Engineering(IPOE). EUV damage tests were conducted on boron carbide(B4C)reflective mirrors,gold(Au)and ruthenium(Ru)metal monolayer mirrors,B4C/Ru bilayer mirrors commonly used in EUV and X-ray free electron lasers,and molybdenum-silicon(Mo/Si)multilayer mirrors used in EUV lithography. Damage resistances for thin-film mirrors with different optical materials and structures were determined. Combined with theoretical simulations,damage mechanisms such as thermal melting,thermal stress,and interlayer diffusion-reaction were detected.更多还原