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Na掺杂MoO3陶瓷靶材的制备及其成膜性能研究
Preparation and film forming properties of Na doped MoO3 ceramic target
【摘要】 为满足薄膜太阳能电池对Na源充足与稳定的需求,以钼酸钠和氧化钼粉为原料,采用放电等离子烧结技术(SPS)制备了Na掺杂MoO3陶瓷靶材(Na-MoO3),研究了烧结温度、烧结助剂Al和Na掺杂含量("含量"指摩尔分数)对Na-MoO3靶材结构、组织、致密度以及Na回收率的影响。结果表明:在烧结助剂Al含量为1%、Na含量为3%、烧结温度为450℃的实验条件下,可以制备出致密度高(相对致密度98.2%)、钠回收率高(94.3%)的Na-MoO3陶瓷靶材。随着掺杂含量的增加,Na-MoO3靶材致密度和Na回收率降低。将含1%Al和3%Na的氧化钼陶瓷靶材通过磁控溅射工艺溅射成膜,所制备的Na-MoO3薄膜结构致密,0.28%Na元素均匀弥散分布于薄膜中。
【Abstract】 In order to meet the requirements of the sufficient and stable Nasource for thin film solar cells, Na ion doped MoO3 ceramic targets(Na-MoO3) were prepared by spark plasma sintering(SPS) using sodium molybdate and molybdenum oxide powder as the raw materials. The effects of the sintering temperature, sintering agent Al and the content of the doped Na(mole fraction) on the structure, microstructure, density and Na recovery of Na-MoO3 target were investigated. The results show that under the condition of 1% Al, 3% Na and 450 ℃ sintering temperature, the Na-MoO3 ceramic target with the high density(relative density of 98.2%) and high sodium recovery(94.3%) can be successfully prepared. With the increase of doping content, the density and Na recovery of Na-MoO3 target decreases. Using MoO3 ceramic containing 3% Na as the sputtering target, the Na-MoO3 thin films were prepared by magnetron sputtering process. The prepared Na-MoO3 thin film has a compact structure and 0.28% Na is uniformly distributed in the film.
【Key words】 SPS; Na doping; MoO3 ceramic target; magnetron sputtering; Na ion source;
- 【文献出处】 电子元件与材料 ,Electronic Components and Materials , 编辑部邮箱 ,2022年01期
- 【分类号】TM914.4;TB383.2
- 【下载频次】134