节点文献
W fuzz layers: very high resistance to sputtering under fusion-relevant He~+ irradiations
【摘要】 In this study, we have modeled the sputtering process of energetic He~+ions colliding with W nano-fuzz materials, based on the physical processes, such as the collision and diffusion of energetic particles, sputtering and redeposition. Our modeling shows that the fuzzy nanomaterials with a large surface-to-volume ratio exhibit very high resistance to sputtering under fusion-relevant He~+irradiations, and their sputtering yields are mainly determined by the thickness of fuzzy nano0materials, the reflection coefficients and mean free paths of energetic particles, surface sputtering yields of a flat base material, and the geometry of nano-fuzz. Our measurements have confirmed that the surface sputtering yield of a W nano-fuzz layer with the columnar geometry of nano-fuzz in cross-section is about one magnitude of order lower than the one of smooth W substrates. This work provides a complete model for energetic particles colliding with the nano-fuzz layer and clarifies the fundamental sputtering process occurring in the nano-fuzz layer.
【Abstract】 In this study, we have modeled the sputtering process of energetic He~+ions colliding with W nano-fuzz materials, based on the physical processes, such as the collision and diffusion of energetic particles, sputtering and redeposition. Our modeling shows that the fuzzy nanomaterials with a large surface-to-volume ratio exhibit very high resistance to sputtering under fusion-relevant He~+irradiations, and their sputtering yields are mainly determined by the thickness of fuzzy nano0materials, the reflection coefficients and mean free paths of energetic particles, surface sputtering yields of a flat base material, and the geometry of nano-fuzz. Our measurements have confirmed that the surface sputtering yield of a W nano-fuzz layer with the columnar geometry of nano-fuzz in cross-section is about one magnitude of order lower than the one of smooth W substrates. This work provides a complete model for energetic particles colliding with the nano-fuzz layer and clarifies the fundamental sputtering process occurring in the nano-fuzz layer.
【Key words】 plasma facing materials; W nano-fuzz; surface sputtering; simulation model;
- 【文献出处】 Plasma Science and Technology ,等离子体科学和技术(英文版) , 编辑部邮箱 ,2022年01期
- 【分类号】O53
- 【下载频次】29