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Fabrication and characterization of superconducting multiqubit device with niobium base layer
【摘要】 Superconducting transmon qubits are the leading platform in solid-state quantum computing and quantum simulation applications. In this work, we develop a fabrication process for the transmon multiqubit device with a niobium base layer,shadow-evaporated Josephson junctions, and airbridges across the qubit control lines to suppress crosstalk. Our results show that these multiqubit devices have well-characterized readout resonators, and that the energy relaxation and Ramsey(spin-echo) dephasing times are up to ~40 μs and 14(47) μs, respectively. We perform single-qubit gate operations that demonstrate a maximum gate fidelity of 99.97%. In addition, two-qubit vacuum Rabi oscillations are measured to evaluate the coupling strength between qubits, and the crosstalk among qubits is found to be less than 1% with the fabricated airbridges. Further improvements in qubit coherence performance using this fabrication process are also discussed.
【Abstract】 Superconducting transmon qubits are the leading platform in solid-state quantum computing and quantum simulation applications. In this work, we develop a fabrication process for the transmon multiqubit device with a niobium base layer,shadow-evaporated Josephson junctions, and airbridges across the qubit control lines to suppress crosstalk. Our results show that these multiqubit devices have well-characterized readout resonators, and that the energy relaxation and Ramsey(spin-echo) dephasing times are up to ~40 μs and 14(47) μs, respectively. We perform single-qubit gate operations that demonstrate a maximum gate fidelity of 99.97%. In addition, two-qubit vacuum Rabi oscillations are measured to evaluate the coupling strength between qubits, and the crosstalk among qubits is found to be less than 1% with the fabricated airbridges. Further improvements in qubit coherence performance using this fabrication process are also discussed.
【Key words】 superconducting quantum computing; transmon qubit; device fabrication; characterization;
- 【文献出处】 Chinese Physics B ,中国物理B , 编辑部邮箱 ,2021年10期
- 【分类号】O413
- 【被引频次】1
- 【下载频次】14