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氮化硅光子器件与应用研究进展
Recent advances in silicon nitride-based photonic devices and applications
【摘要】 氮化硅材料提供了一种与CMOS兼容的集成光子平台,具有丰富的光学特性。通过调节相关制备参数,可以获得特定折射率的薄膜材料,且消光系数和非线性系数具有较大可调控范围。因此,氮化硅材料在薄膜光学、微纳平面光学、非线性集成光学等诸多领域具有广泛的应用前景。本文主要介绍氮化硅材料的光学特性及其在光学薄膜、微纳超构材料和硅光集成器件方面的研究现状,综述氮化硅材料在太阳能薄膜、可见光超构表面、光栅耦合器和非线性光波导等应用领域的研究概况。
【Abstract】 Silicon nitride provides a CMOS-compatible integrated photonic platform with rich optical properties. By adjusting the relevant fabrication parameters, silicon nitride with specific refractive index between 1.9~3.2 can be achieved, and its extinction and nonlinear coefficient can have a large adjustable range. Silicon nitride has wide potential applications in many fields such as thin film optics, micro-nano planar optics and nonlinear integrated photonics. In this paper, we review the optical properties of silicon nitride and its recent advances in optical film, micro-nano metamaterial and silicon photonics, and also review the research progresses on the applications of solar thin films, visible metasurfaces, grating couplers and nonlinear optical waveguides.
【Key words】 silicon nitride; metasurface; optical film; grating coupler; nonlinear optical waveguide;
- 【文献出处】 中国光学 ,Chinese Optics , 编辑部邮箱 ,2021年04期
- 【分类号】TN256
- 【被引频次】3
- 【下载频次】863