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Mo掺杂调控电子结构增强NiS电催化固氮性能
Manipulating Electronic Structure of NiS by Mo Doping for Boosting Electrocatalytic Nitrogen Fixation
【摘要】 以泡沫镍为骨架,通过水热法制备了Mo掺杂的NiS多级纳米花状结构(Mo-NiS)。在偏压为-0.7 V(vs RHE)下,2 h内,0.83 Mo-NiS(制备时钼、镍物质的量之比为0.83)的电催化固氮速率平均可达4.21μg·cm-2·h-1,法拉第效率平均为18%。XPS测试和DFT计算表明,Mo掺杂增加了Ni活性位点周围的电子云密度,提高了电荷传输速率,促使*NNH2到*N能垒大幅度降低,从而提升了电催化固氮效率。
【Abstract】 Mo doped NiS(Mo-NiS) hierarchical nanoflowers were prepared on porous nickel foam substrates by hydrothermal method for high-efficient electrocatalytic nitrogen fixation. Within 2 h, the optimized Mo-NiS sample0.83 Mo-NiS(the ratio of the amount of molybdenum and nickel during preparation was 0.83) exhibited a remark-able average NH3 formation rate of 4.21 μg·cm-2·h-1 and an average Faraday efficiency of 18% at-0.7 V(vs RHE).XPS and DFT analysis revealed that Mo doping NiS nanoflower increased the electron cloud density of Ni atom, and reduced the energy barrier from *NNH2 to *N in the rate-determining step for nitrogen fixation.
【Key words】 NiS; nanoflower; Mo doping; charge transfer; electrocatalytic nitrogen fixation;
- 【文献出处】 无机化学学报 ,Chinese Journal of Inorganic Chemistry , 编辑部邮箱 ,2021年07期
- 【分类号】TQ113.26;TQ426
- 【被引频次】1
- 【下载频次】244