【摘要】 采用直流磁控溅射镀膜法在石英玻璃衬底制备铬膜,利用SEM和EDS对铬膜层的针孔及周围分别进行了形貌和元素表征,研究了膜层针孔缺陷的成因及管控方法。结果表明,在匀胶铬板生产过程中,不稳定的基片表面会吸附环境中的粉尘颗粒、细菌等杂质,阻挡铬膜的沉积,在杂质去除后形成针孔。采取了以下管控措施:镀膜前采用浓度3%H₂O₂对清洗机泡槽4 h;严格遵守操作规范;加强镀膜机的卫生处理。管控措施实行4个月后,针孔平均密度由之前的7.04个/片减少到3.36个/片,针孔良率提高了约10%。更多还原

【Abstract】 A chromium film was prepared on quartz glass substrate by using DC magnetron sputtering coater. The morphology and elements of the pinholes and their surroundings were characterized by means of SEM and EDS, and the causes and control measures for the pinhole defects on the film were all investigated. The results show that during the production of chromium mask, the impurities such as dust particles and bacteria in the environment can be absorbed on the surface of unstable substrate, which can resist the deposition of chromium film, leading to the formation of pinholes after the removal of impurities. Aiming at this problem, the following control measures were proposed. The tanks of cleaning machine should be soaked into the 3%H₂O₂ solution for 4 h before sputtering, operation standard should be strictly observed, and hygienic condition of the coating machine should be improved. It is shown that the average pinhole density decreased from 7.04 per piece before to 3.36 per piece after the control measures had been taken for four months, indicating that improvement rate of pinholes had enhanced by about 10%.更多还原