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透射电子显微镜-能谱中载网支持膜所含杂质成分的影响与分析

The impact and analysis of impure grids with support film on TEM-EDS test

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【作者】 沈素丹郑娜浦群张斌贺静房尔园徐丽

【Author】 SHEN Su-dan;ZHENG Na;PU Qun;ZHANG Bin;HE Jing;FANG Er-yuan;XU Li;College of Chemical Engineering and Biological Engineering, State Key Laboratory of Chemical Engineering,Zhejiang University;

【通讯作者】 徐丽;

【机构】 浙江大学化学工程与生物工程学院化学工程联合国家重点实验室

【摘要】 载网支持膜是透射电子显微镜测试的前提与保障,但在透射电子显微镜-能谱测试中发现其存在外源杂质元素污染的情况。对市面上的各类常规载网支持膜进行检测,显示其均含有杂质元素Si。外源杂质元素的存在严重造成了样品透射电子显微镜-能谱数据结果的误差。为防止杂质元素的干扰和混淆,本文分析确认了载网支持膜杂质的来源,是由于制膜过程中未去除含Si助剂的清洗剂成份,而其生成的硅胶SiO2与Formvar膜生成了氢键结合,吸附于支持膜表面。

【Abstract】 The grids with support film are the prerequisite and guarantee for transmission electron microscope test(TEM), but in the TEM-EDS test, it is found that it is contaminated by external impurity elements. The test data of all kinds of conventional grids with support films on the market show that they all contain the impurity element Si. The presence of external impurity elements seriously caused errors in the results of the samples’ TEM-EDS data. In order to prevent the interference and confusion of impurity elements, this paper analyzes and confirms that the cause of impurities in the support film is that the silica gel SiO2 is formed by the cleaning agent containing Si additives and then forms hydrogen bonding with Formvar film during the film formation process.

【基金】 浙江大学实验技术研究项目(No.SJS202009)
  • 【文献出处】 电子显微学报 ,Journal of Chinese Electron Microscopy Society , 编辑部邮箱 ,2021年05期
  • 【分类号】TB302
  • 【下载频次】572
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