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透射电子显微镜-能谱中载网支持膜所含杂质成分的影响与分析
The impact and analysis of impure grids with support film on TEM-EDS test
【摘要】 载网支持膜是透射电子显微镜测试的前提与保障,但在透射电子显微镜-能谱测试中发现其存在外源杂质元素污染的情况。对市面上的各类常规载网支持膜进行检测,显示其均含有杂质元素Si。外源杂质元素的存在严重造成了样品透射电子显微镜-能谱数据结果的误差。为防止杂质元素的干扰和混淆,本文分析确认了载网支持膜杂质的来源,是由于制膜过程中未去除含Si助剂的清洗剂成份,而其生成的硅胶SiO2与Formvar膜生成了氢键结合,吸附于支持膜表面。
【Abstract】 The grids with support film are the prerequisite and guarantee for transmission electron microscope test(TEM), but in the TEM-EDS test, it is found that it is contaminated by external impurity elements. The test data of all kinds of conventional grids with support films on the market show that they all contain the impurity element Si. The presence of external impurity elements seriously caused errors in the results of the samples’ TEM-EDS data. In order to prevent the interference and confusion of impurity elements, this paper analyzes and confirms that the cause of impurities in the support film is that the silica gel SiO2 is formed by the cleaning agent containing Si additives and then forms hydrogen bonding with Formvar film during the film formation process.
【Key words】 the grids with support film; transmission electron microscope; energy dispersive X-ray analysis; impurity; Si;
- 【文献出处】 电子显微学报 ,Journal of Chinese Electron Microscopy Society , 编辑部邮箱 ,2021年05期
- 【分类号】TB302
- 【下载频次】572