【摘要】 目前大多数硫沉积研究停留在宏观实验阶段,主要研究固态硫对储层的伤害,而固态硫颗粒在微观孔隙中的运移沉积机理尚未见报道。文中通过ICEM软件构建孔喉简化模型,运用Fluent的离散相DPM模型,模拟分析固态硫颗粒在孔喉中的微观运移沉积机理。模拟结果表明:固态硫颗粒在孔隙中的运移过程分为进入孔喉、通过孔喉、颗粒沉积3个阶段;运移过程中硫沉积率与气体中硫颗粒直径、孔喉直径、硫颗粒质量流量、压差等因素有关;以直径0.5μm的固态硫颗粒为例,当孔隙直径为10μm、喉道直径为5μm时,硫颗粒沉积达到稳定,硫沉积率为4.42%。研究成果能为高含硫气藏硫沉积机理研究及防治提供依据。更多还原

【Abstract】 At present, most sulfur deposition studies stay in the stage of macroscopic experiments, mainly studying the damage of solid sulfur to the reservoir, while the transport deposition pattern of solid sulfur particles in microscopic pore throats has not been reported. In this paper, a simplified model of pore throat is constructed by ICEM, and the discrete-phase DPM model of Fluent is applied to simulate and analyze the microscopic transport deposition mechanism of solid sulfur particles in the pore throat. The simulation results show that the transport process of solid sulfur particles in the pore throat is divided into three stages: entering the pore throat, passing through the pore throat, and particle deposition. The sulfur deposition rate in the transport process is related to the sulfur particle diameter in the gas, pore throat diameter, particle mass flow rate, pressure difference, and other factors. Taking the solid sulfur particle diameter of 0.5 μm as an example, when the pore diameter is 10 μm, the throat diameter is 5 μm, the sulfur particle deposition reaches stability, and the sulfur deposition rate is 4.42%. The research results can provide a basis for the mechanism of sulfur deposition and prevention in high sulfur gas reservoirs.更多还原