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新型研发机构专利质量指标体系建设探讨——以某新型研发机构为例

Discussion on the Construction of Patent Quality Index System in new R&D Institutions——Take a new R&D Institute as an Example

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【作者】 吴浩崔荣李云彭超云

【Author】 WU Hao;CUI Rong;LI Yun;PENG Chaoyun;College of Chemical Engineering, Beijing University of Chemical Technology;Changzhou Institute of Advanced Materials, Beijing University of Chemical Technology;

【通讯作者】 吴浩;

【机构】 北京化工大学化学工程学院北京化工大学常州先进材料研究院

【摘要】 中国知识产权事业发展迅速,中国的知识产权整体质量逐年提高,知识产权的创造、运用和保护体系建设逐步完善。该文以新型研发机构的专利质量指标体系为切入点,并根据新型研发机构的发展特点,对新型研发机构的专利质量体系建设中的量化指标体系进行了分析和研究,分别从专利结构、申请量、授权量、授权率、发明人、关键词、权利要求数、被无效数和同族专利等方面进行了深入研究和探讨,同时基于某新型研发机构的专利数据进行了分析。

【Abstract】 In China,intellectual property has developed rapidly,the overall quality of intellectual property has also been improved year by year,and intellectual property systems in terms of creation,application and protection have been gradually progressed.According to the development characteristics of new R&D institutions,this article analyzes and studies the quantitative index system in the construction of the patent quality system of new R&D institutions from the following aspects including type of patent,number of patents application and authorization,authorization rate,inventors,keywords,number of claims,number of invalidation and patent families.Meanwhile,the patent data of a new R&D institution has been analyzed.

【关键词】 新型研发机构专利质量体系
【Key words】 New R&D institutionsPatentsQualitySystem
  • 【文献出处】 科技资讯 ,Science & Technology Information , 编辑部邮箱 ,2020年31期
  • 【分类号】G306
  • 【下载频次】166
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