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Simulation study of device physics and design of GeOI TFET with PNN structure and buried layer for high performance

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【作者】 王斌胡晟冯越李鹏胡辉勇舒斌

【Author】 Bin Wang;Sheng Hu;Yue Feng;Peng Li;Hui-Yong Hu;Bin Shu;State Key Discipline Laboratory of Wide Bandgap Semiconductor Technology, School of Microelectronics,Xidian University;Xi’an Microelectronic Technology Institute;

【通讯作者】 王斌;

【机构】 State Key Discipline Laboratory of Wide Bandgap Semiconductor Technology, School of Microelectronics,Xidian UniversityXi’an Microelectronic Technology Institute

【摘要】 Large threshold voltage and small on-state current are the main limitations of the normal tunneling field effect transistor(TFET).In this paper,a novel TFET with gate-controlled P+N+N+ structure based on partially depleted GeOI(PD-GeOI) substrate is proposed.With the buried P+-doped layer(BP layer) introduced under P+N+N+ structure,the proposed device behaves as a two-tunneling line device and can be shut off by the BP junction,resulting in a high on-state current and low threshold voltage.Simulation results show that the on-state current density Ion of the proposed TFET can be as large as 3.4×10-4 A/μm,and the average subthreshold swing(SS) is 55 mV/decade.Moreover,both of Ion and SS can be optimized by lengthening channel and buried P+layer.The off-state current density of TTP TFET is 4.4×10-10 A/μm,and the threshold voltage is 0.13 V,showing better performance than normal germanium-based TFET.Furthermore,the physics and device design of this novel structure are explored in detail.

【Abstract】 Large threshold voltage and small on-state current are the main limitations of the normal tunneling field effect transistor(TFET).In this paper,a novel TFET with gate-controlled P+N+N+ structure based on partially depleted GeOI(PD-GeOI) substrate is proposed.With the buried P+-doped layer(BP layer) introduced under P+N+N+ structure,the proposed device behaves as a two-tunneling line device and can be shut off by the BP junction,resulting in a high on-state current and low threshold voltage.Simulation results show that the on-state current density Ion of the proposed TFET can be as large as 3.4×10-4 A/μm,and the average subthreshold swing(SS) is 55 mV/decade.Moreover,both of Ion and SS can be optimized by lengthening channel and buried P+layer.The off-state current density of TTP TFET is 4.4×10-10 A/μm,and the threshold voltage is 0.13 V,showing better performance than normal germanium-based TFET.Furthermore,the physics and device design of this novel structure are explored in detail.

【基金】 Project supported by the National Natural Science Foundation of China (Grant No. 61704130);the Science Research Plan in Shaanxi Province,China (Grant No. 2018JQ6064);the Science and Technology Project on Analog Integrated Circuit Laboratory,China (Grant No. JCKY2019210C029)
  • 【文献出处】 Chinese Physics B ,中国物理B , 编辑部邮箱 ,2020年10期
  • 【分类号】TN386
  • 【下载频次】46
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