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Simulation study of device physics and design of GeOI TFET with PNN structure and buried layer for high performance
【摘要】 Large threshold voltage and small on-state current are the main limitations of the normal tunneling field effect transistor(TFET).In this paper,a novel TFET with gate-controlled P+N+N+ structure based on partially depleted GeOI(PD-GeOI) substrate is proposed.With the buried P+-doped layer(BP layer) introduced under P+N+N+ structure,the proposed device behaves as a two-tunneling line device and can be shut off by the BP junction,resulting in a high on-state current and low threshold voltage.Simulation results show that the on-state current density Ion of the proposed TFET can be as large as 3.4×10-4 A/μm,and the average subthreshold swing(SS) is 55 mV/decade.Moreover,both of Ion and SS can be optimized by lengthening channel and buried P+layer.The off-state current density of TTP TFET is 4.4×10-10 A/μm,and the threshold voltage is 0.13 V,showing better performance than normal germanium-based TFET.Furthermore,the physics and device design of this novel structure are explored in detail.
【Abstract】 Large threshold voltage and small on-state current are the main limitations of the normal tunneling field effect transistor(TFET).In this paper,a novel TFET with gate-controlled P+N+N+ structure based on partially depleted GeOI(PD-GeOI) substrate is proposed.With the buried P+-doped layer(BP layer) introduced under P+N+N+ structure,the proposed device behaves as a two-tunneling line device and can be shut off by the BP junction,resulting in a high on-state current and low threshold voltage.Simulation results show that the on-state current density Ion of the proposed TFET can be as large as 3.4×10-4 A/μm,and the average subthreshold swing(SS) is 55 mV/decade.Moreover,both of Ion and SS can be optimized by lengthening channel and buried P+layer.The off-state current density of TTP TFET is 4.4×10-10 A/μm,and the threshold voltage is 0.13 V,showing better performance than normal germanium-based TFET.Furthermore,the physics and device design of this novel structure are explored in detail.
【Key words】 Ge-based TFET; two line tunneling paths; point tunneling; on-state current density;
- 【文献出处】 Chinese Physics B ,中国物理B , 编辑部邮箱 ,2020年10期
- 【分类号】TN386
- 【下载频次】46