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Improvement of valley splitting and valley injection efficiency for graphene/ferromagnet heterostructure

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【作者】 徐龙翔吕文刚胡晨郭奇勋尚帅徐秀兰于广华岩雨王立华滕蛟

【Author】 Longxiang Xu;Wengang Lu;Chen Hu;Qixun Guo;Shuai Shang;Xiulan Xu;Guanghua Yu;Yu Yan;Lihua Wang;Jiao Teng;Department of Materials Physics and Chemistry, University of Science and Technology Beijing;Institute of Physics, Chinese Academy of Sciences;Beijing Key Laboratory for Nanomaterials and Nanodevices;Center for the Physics of Materials and Department of Physics, McGill University;Corrosion and Protection Center, Key Laboratory for Environmental Fracture (MOE), University of Science and Technology Beijing;Institute of Microstructure and Property of Advanced Materials, Beijing Key Laboratory of Microstructure and Property of Advanced Materials, Beijing University of Technology;

【通讯作者】 吕文刚;滕蛟;

【机构】 Department of Materials Physics and Chemistry, University of Science and Technology BeijingInstitute of Physics, Chinese Academy of SciencesBeijing Key Laboratory for Nanomaterials and NanodevicesCenter for the Physics of Materials and Department of Physics, McGill UniversityCorrosion and Protection Center, Key Laboratory for Environmental Fracture (MOE), University of Science and Technology BeijingInstitute of Microstructure and Property of Advanced Materials, Beijing Key Laboratory of Microstructure and Property of Advanced Materials, Beijing University of Technology

【摘要】 The valley splitting has been realized in the graphene/Ni heterostructure with the splitting value of 14 me V, and the obtained valley injecting efficiency from the heterostructure into graphene was 6.18% [Phys. Rev. B 92 115404(2015)]. In this paper, we report a way to improve the valley splitting and the valley injecting efficiency of the graphene/Ni heterostructure. By intercalating an Au monolayer between the graphene and the Ni, the split can be increased up to 50 meV. However,the valley injecting efficiency is not improved because the splitted valley area of graphene moves away from the Fermi level.Then, we mend the deviation by covering a monolayer of Cu on the graphene. As a result, the valley injecting efficiency of the Cu/graphene/Au/Ni heterostructure reaches 10%, which is more than 60% improvement compared to the simple graphene/Ni heterostructure. Then we theoretically design a valley-injection device based on the Cu/graphene/Au/Ni heterostructure and demonstrate that the valley injection can be easily switched solely by changing the magnetization direction of Ni, which can be used to generate and control the valley-polarized current.

【Abstract】 The valley splitting has been realized in the graphene/Ni heterostructure with the splitting value of 14 me V, and the obtained valley injecting efficiency from the heterostructure into graphene was 6.18% [Phys. Rev. B 92 115404(2015)]. In this paper, we report a way to improve the valley splitting and the valley injecting efficiency of the graphene/Ni heterostructure. By intercalating an Au monolayer between the graphene and the Ni, the split can be increased up to 50 meV. However,the valley injecting efficiency is not improved because the splitted valley area of graphene moves away from the Fermi level.Then, we mend the deviation by covering a monolayer of Cu on the graphene. As a result, the valley injecting efficiency of the Cu/graphene/Au/Ni heterostructure reaches 10%, which is more than 60% improvement compared to the simple graphene/Ni heterostructure. Then we theoretically design a valley-injection device based on the Cu/graphene/Au/Ni heterostructure and demonstrate that the valley injection can be easily switched solely by changing the magnetization direction of Ni, which can be used to generate and control the valley-polarized current.

【基金】 Project supported by the National Key R&D Program of China (Grant No. 2017YFF0206104);the National Natural Science Foundation of China (Grant No. 51871018);Beijing Laboratory of Metallic Materials and Processing for Modern Transportation,the Opening Project of Key Laboratory of Microelectronics Devices&Integrated Technology,Institute of Microelectronics of Chinese Academy of Sciences,Beijing Natural Science Foundation,China (Grant No. Z180014);Beijing Outstanding Young Scientists Projects;China (Grant No. BJJWZYJH01201910005018);the Chinese Academy of Sciences for providing computation facilities
  • 【文献出处】 Chinese Physics B ,中国物理B , 编辑部邮箱 ,2020年07期
  • 【分类号】TQ127.11
  • 【下载频次】18
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