【摘要】 六价铬毒性很强,含六价铬的工业废水严重危害人类健康。制备了一种掺杂碳化硅的碳钛网电极,通过扫描电镜、氮气物理吸脱附与循环伏安法对其进行表征,并将其用于模拟六价铬废水电还原。结果表明,掺杂碳化硅使电极的比表面积和孔体积分别增加了4.5%和10.9%。较低的pH值有利于电还原,当pH值为1.5和电压为2.5V时,浓度为40ppm的六价铬溶液可以在45min内被完全还原。循环伏安曲线表明电极在表面双电层与赝电容共同作用下将六价铬还原为三价铬,碳化硅的掺杂增加了电极的电化学活性。对于实际生产中六价铬工业废水的电还原解毒有一定指导意义。更多还原

【Abstract】 Cr(Ⅵ)is very toxic and industrial waste water containing Cr(Ⅵ)is seriously harmful to human health.In this paper,a carbon Ti mesh electrode doped with SiC was prepared and characterized by SEM,N2 physical adsorption-desorption and CV.The results showed that the specific surface area and pore volume increased by 4.5%and 10.9%,respectively.The lower pH value was conducive to the reduction of Cr(Ⅵ).When the pH value was 1.5 and the voltage was 2.5 V,the Cr(Ⅵ)solution with a concentration of 40 ppm can be completely reduced within 45 min.The CV curves showed that the electrode reduced Cr(Ⅵ)to Cr(Ⅲ)under the action of surface double layer and pseudocapacitance,and the doping of SiC increased the electrochemical activity of the electrode.It has certain guiding significance for the electroreduction detoxification of industrial wastewater containing Cr(Ⅵ)in actual production.更多还原