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Comparison of Cavities Formed in Single Crystalline and Polycrystalline α-SiC after H Implantation

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【作者】 廖庆康龙张桐民刘会平王韬李小刚李锦钰杨振李炳生

【Author】 Qing Liao;Long Kang;Tong-Min Zhang;Hui-Ping Liu;Tao Wang;Xiao-Gang Li;Jin-Yu Li;Zhen Yang;Bing-Sheng Li;State Key Laboratory for Environment-Friendly Energy Materials,Southwest University of Science and Technology;Institute of Modern Physics,Chinese Academy of Sciences;Institute of Fluid Physics,China Academy of Engineering Physics;Sino-French Institute of Nuclear Engineering and Technology,Sun Yat-Sen University;

【通讯作者】 李炳生;

【机构】 State Key Laboratory for Environment-Friendly Energy Materials,Southwest University of Science and TechnologyInstitute of Modern Physics,Chinese Academy of SciencesInstitute of Fluid Physics,China Academy of Engineering PhysicsSino-French Institute of Nuclear Engineering and Technology,Sun Yat-Sen University

【摘要】 Cavities and extended defects formed in single crystalline and polycrystalline α-SiC implanted with H+ions are compared.The samples are investigated by cross-sectional transmission electron microscopy.H2 bubbles are formed during H implantation and H2 molecules escape the sample to form cavities during thermal annealing at 1100℃.Microcracks and the extended defects prefer to nucleate in single crystalline α-SiC,but not polycrystalline α-Si C.Grain boundaries can account for the experimental results.The formation of cavities on grain boundaries is investigated.

【Abstract】 Cavities and extended defects formed in single crystalline and polycrystalline α-SiC implanted with H+ions are compared.The samples are investigated by cross-sectional transmission electron microscopy.H2 bubbles are formed during H implantation and H2 molecules escape the sample to form cavities during thermal annealing at 1100℃.Microcracks and the extended defects prefer to nucleate in single crystalline α-SiC,but not polycrystalline α-Si C.Grain boundaries can account for the experimental results.The formation of cavities on grain boundaries is investigated.

【基金】 Supported by the National Natural Science Foundation of China (Grant Nos.U1832133 and 11905206)
  • 【文献出处】 Chinese Physics Letters ,中国物理快报(英文版) , 编辑部邮箱 ,2020年07期
  • 【分类号】TQ163.4
  • 【下载频次】24
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