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金属薄膜厚度测量技术分析
Metallic Thin Film Thickness Measurement Technology and its Analysis
【摘要】 金属薄膜广泛应用于航空航天、车辆交通、半导体和微电子等领域,对其厚度准确性和均匀性的测量成为评价薄膜功能和质量的重要手段。总结了金属覆盖膜和自支撑薄膜厚度的常用测量方法,包括X射线荧光法、接触式轮廓法、激光共焦显微法、白光干涉显微法以及光谱共焦法,重点分析了它们的优缺点,发现尽量减小厚度测量原理性误差、提高薄膜密度测量的准确性有助于实现X射线荧光法与其他薄膜厚度测量方法的量值统一,为薄膜厚度测量技术的溯源提供了新的研究方向。
【Abstract】 Metallic thin films are widely used in aerospace,vehicle transportation,semiconductor,microelectronics,and other fields. The measurement of thickness accuracy and uniformity has become an essential means to evaluate the function and quality of thin films. This paper described the commonly used measurement methods for the thickness of the metal coated film and self-supporting film,including the X-ray fluorescence method,contact profilometer method,confocal laser scanning microscopy,white light interferometry,and spectral confocal microscopy method,and analyzed their respective advantages and disadvantages. It is found that reducing the error of principle of thickness measurement,as well as improving the accuracy of film density measurement is helpful to realize the quantitative uniformity of thickness measurement results between X-ray fluorescence method and other measurement methods,which provides a new research direction for the traceability of film thickness measurement technology.
【Key words】 metallic thin films; thickness measurement; quantitative uniformity;
- 【文献出处】 计量技术 ,Measurement Technique , 编辑部邮箱 ,2020年07期
- 【分类号】TB383.2
- 【被引频次】2
- 【下载频次】619